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CMOS image sensor pixels

An image sensor and pixel technology, applied in the field of CMOS image sensor pixels, can solve the problems of inability to realize and increase the workload of layout design, and achieve the effect of reducing difficulty, reducing workload, and not blocking incident light.

Inactive Publication Date: 2007-10-31
GALAXYCORE SHANGHAI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Not only increases the workload of layout design, but in some cases, it is impossible to realize, especially when there are many metal layers

Method used

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Embodiment Construction

[0012] As shown in Fig. 2, the CMOS image sensor pixel described in the present invention aims at the limitations of the method of making different offsets of the metal layer of each pixel relative to the photosensitive area in the prior art, and proposes a mirror offset method. Concept of shift layout design. That is, a certain layer or several layers of metal in the pixel array are divided into metal on the left and metal on the right relative to the boundary line of a certain position; among them, the metal on the left is offset to the right, and the metal on the right Offset to the left; the metal on the left and the metal on the right can be completely equal or unequal in offset; but when the offset is not equal, the difference is less than or equal to 0.2 microns, and they are roughly equal.

[0013] Another technical solution adopted by the present invention is that at least one layer of metal in the pixel array, the metal on the upper side is offset downward, and the m...

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PUM

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Abstract

The invention discloses a CMOS image sensor pels, thereinto, said pixel array at least includes a layer of metal, left-hand metal shift right, right-hand metal shift left, offset of said left-hand metal and right-hand metal are equal, or the offset is within 0. 2 micron. The invention can make metal layer not keep out incidence light, but also reduce the workload and difficulty of designing territory.

Description

technical field [0001] The present invention relates to a CMOS (Complementary Metal Oxide Semiconductor) image sensor pixel. Background technique [0002] Compared with CCD (Charge Coupled Device), CMOS image sensor has the advantages of high integration, low power consumption, and low cost, and has been more and more widely used. With the advancement of technology and market demand, the resolution of CMOS image sensors is getting higher and higher, while the pixel size is getting smaller and smaller, reaching 2.2 microns or even smaller. Such a small pixel can cause a series of problems, one of which is that the metal layer will block the incident light. Not only will the pixel sensitivity be reduced, but the metal will reflect and scatter the incident light, causing noise. In order to solve this problem, it is proposed that the metal layer of each pixel is offset relative to the photosensitive area, and the offset amount of the metal layer of each pixel is different, so a...

Claims

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Application Information

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IPC IPC(8): H01L27/146H01L23/528
Inventor 李杰董建民徐春花
Owner GALAXYCORE SHANGHAI
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