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Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method

A technology for displacement measurement and lithography equipment, applied in the field of manufacturing devices, can solve the problems of increasing the moving range of the substrate table, increasing the cost, and difficulty in large targets.

Active Publication Date: 2011-12-14
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If large targets can be expensive, since it is often difficult to manufacture large targets with the desired accuracy over their full range
Therefore, increasing the range of movement of the substrate table significantly increases the cost of the system used to measure the position and / or movement of the substrate table

Method used

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  • Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
  • Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
  • Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method

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Embodiment Construction

[0021] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically depicted. The apparatus comprises an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation or DUV radiation); a support structure (e.g. mask table) MT configured to support a patterning device (e.g. mask Die) MA, and is connected with the first positioner PM that is configured to accurately position the patterning device according to certain parameters; Substrate table (such as wafer stage) WT, it is configured to support substrate (such as photoresist coating coated wafer) W, and is connected to the second positioning device PW configured to accurately position the substrate according to certain parameters; The pattern imparted to the radiation beam B is projected onto a target portion C of the substrate W (eg, containing one or more dies).

[0022] The illumination system may include various types of optical elements tha...

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PUM

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Abstract

A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.

Description

technical field [0001] The invention relates to a displacement measurement system, a lithographic apparatus using such a system, a displacement measurement method and a method for manufacturing a device. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In that case, a patterning device, otherwise known as a mask or reticle, may be utilized to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred to a target portion (eg, a portion containing one or several dies) on a substrate (eg, a silicon wafer). The transfer of the pattern is usually by means of imaging on a layer of radiation-sensitive material (photoresist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target moi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03B27/53G03F7/70775G03F7/70733G01B11/002G03F7/7085H01L21/0274
Inventor B·A·J·卢蒂克休斯H·H·M·科克斯E·R·卢普斯特拉E·A·F·范德帕施H·K·范德舒特
Owner ASML NETHERLANDS BV