Composition of aluminum boron silicate glass and application

A technology of aluminoborosilicate and glass, which is applied to the application of the glass plate in flat panel displays, TFT-LCD glass substrates, glass substrates for flat panel displays, can solve the impact of glass yield, the difficulty of high-quality glass plates, Problems such as shortened kiln life

Active Publication Date: 2007-12-26
HENAN ANCAI HI-TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

From the perspective of glass producers, excessively high glass melting temperature will accelerate the erosion of glass furnace refractory materials and shorten the life of the furnace. Excessively high glass melting temperature will also limit the use of high-temperature instruments and equipment. It will cause difficulties in providing high-quality glass plates, the yield of glass will be affected, and the cost will increase; in addition, the excessively high melting temperature will cause increased energy consumption

Method used

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Embodiment Construction

[0029] The present invention also provides a glass plate formed from aluminoborosilicate glass, wherein the composition of the glass expressed in weight percentage is: 54.5-61 SiO 2 , 8-11B 2 o 3 , 14-20 Al 2 o 3 , 0-2 MgO, 3-9 CaO, 0-6 SrO, 0-10.5 BaO, 0-0.5 ZnO, 0-0.3 ZrO 2 , 0.001-4 GeO 2 , 0-3 Ga 2 o 3 , 0.001-0.08 R 2 O (R=Li, Na, K), where MgO+CaO+SrO+BaO is 8-18, SiO 2 +Al 2 o 3 For 68-78. Among them, the preferred GeO 2 The content is 0.1-4, preferably Ga 2 o 3 The content is 0.001-3, preferably R 2 The O content is 0.01-0.06, and the glass also contains at least one clarifying agent selected from the following components: 0-1.5 As 2 o 3 , 0-0.7 Sb 2 o 3 , 0-1.5 SnO 2 , 0-0.5 CeO 2 , 0-2 Cl. The density of said glass is less than 2.6g / cm 3 , preferably not more than 2.55g / cm 3 ; The average linear expansion coefficient in the range of 20-300°C is greater than 32×10 -7 / ℃, less than 39×10 -7 / °C, preferably less than 38×10 -7 / °C; the strain po...

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Abstract

This invention relates to aluminum borosilicate glass with high elastic modulus and its application. The aluminum borosilicate glass is prepared from: 55-63.5 wt.% SiO2, 8-10.5 wt.% B2O3, 15-21 wt.% Al2O3, 0-3.5 wt.% MgO, 4-10 wt.% CaO, 0-5 wt.% SrO, 1-5.5 wt.% BaO, 0.001-4 wt.% Y2O3, 0-2.5 wt.% La2O3, 0-0.5 wt.% ZnO, 0-0.3 wt.% ZrO2, and 0.005-0.08 wt.% R2O (R = Li, Na or K). The aluminum borosilicate glass has such advantages as high strain point, low expansion coefficient, high elastic modulus and no alkali, and is suitable for flat panel display and TFT-LCD glass substrate.

Description

technical field [0001] The invention relates to a substantially alkali-free aluminoborosilicate glass composition for flat panel displays, which has a lower melting temperature and is suitable for flat panel displays, especially for TFT-LCD glass substrates; the invention also relates to A glass substrate for a flat panel display is produced according to a substantially alkali-free aluminoborosilicate glass composition, and the invention also relates to the application of the glass plate in a flat panel display. Background of the invention [0002] Flat-panel display glass substrates are widely used in liquid crystal displays-LCD (Liqiud Crystal Displays), thin film electroluminescence displays-TFED (Thin Film Electroluminescent Displays), plasma displays-PDP (Plasma Display Panels), EL displays, etc. Among them, LCD displays have the most stringent requirements on the nature of the glass substrate itself and the quality of the flat panel, while the requirements on TFED and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/093C03C3/091
CPCC03C3/095C03C3/091C03C3/093
Inventor 赵文明曹国喜陈安国张广涛付玉川
Owner HENAN ANCAI HI-TECH
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