Vacuum pump self-diagnosis method, vacuum pump self-diagnosis system, and vacuum pump central monitoring system

Abstract

There are provided a vacuum pump self-diagnosis method, a vacuum pump self-diagnosis system, a vacuum pump central monitoring system capable of making self-diagnosis of a dry vacuum pump. A vacuum pump self-diagnosis method decides the occurrence of failure and generates an alarm when a predetermined alarm set value is exceeded by an integrated value or an average value of a current of a motor for rotating a rotor of said vacuum pump. In a vacuum pump self-diagnosis system for making self-diagnosis of a vacuum pump which comprises a casing and a rotor rotatably arranged in the casing for sucking and discharging a gas through rotations of the rotor, the rotor comprises a plurality of stages and a pressure sensor is provided between the rotor stages. A self-diagnosis unit is provided for calculating an integrated value or an average value of a current of a motor for rotating said rotor, and making self-diagnosis of the vacuum pump when the integrated value or average value exceeds a predetermined alarm set value. The self-diagnosis unit switches from one self-diagnosis calculation method to another or interrupts the self-diagnosis calculation based on a pressure value detected by said pressure sensor.

Description

technical field [0001] The present invention relates to a vacuum pump self-diagnosis method, a vacuum pump self-diagnosis system, and a vacuum pump central monitoring system for performing self-diagnosis of a dry vacuum pump in which by-products are deposited due to reactions during processing. Background technique [0002] In recent years, with the increasing integration of semiconductor devices, the diameter of semiconductor wafers and the size of liquid crystal panels are gradually increasing, resulting in higher unit prices for each semiconductor wafer and liquid crystal panel. For this reason, it is necessary to stabilize the manufacturing process to increase the yield of products. In particular, stable operation has been recognized as a decisive challenge for devices that directly affect the manufacturing process, such as dry vacuum pumps. [0003] In a batch processing device that processes a large number of wafers in batches in a single process such as LP-CVD (Low P...

AI Technical Summary

Problems solved by technology

Although this existing central monitoring system can use several computers (personal computers) to monitor a plurality of dry vacuum pumps for different operating conditions, it does not have the function of performing self-diagnosis of the dry vacuum pumps

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