Macrotype light shield protective film accepting container

Abstract

A case for housing a large-sized pellicle having an area of 1000 cm<2> or more which is composed of a tray for housing a pellicle and a lid for covering the tray, wherein said lid and / or tray comprises a material having a honeycomb structure.

Description

technical field [0001] The present invention relates to a container for a photoresist film, and more particularly to a container for a large-sized photoresist film used to prevent foreign matter from adhering to a photomask used in a photolithography process when manufacturing an LSI or a liquid crystal panel or template. Background technique [0002] Conventionally, in the manufacture of semiconductor circuit patterns and the like, a dustproof means called a photomask pellicle is generally used to prevent foreign matter from adhering to a photomask or a stencil (for example, refer to Patent Document 1). The photomask protection film has a shape consistent with the shape of the photomask or the stencil, and the upper edge surface of the frame with a thickness of about several millimeters is tensely bonded with nitrocellulose and fiber with a thickness of 10 microns or less. transparent polymer film (hereinafter referred to as the photomask protection film body) such as elem...

AI Technical Summary

Problems solved by technology

[0009] If the adhesive material is deformed, when the mask is attached, a part of the mask adhesive material may not be attached to the mask, etc., and poor adhesion may occur.

[0010] Furthermore, since the rigidity of the storage container is insufficient, there may be a problem that the storage container may be deformed depending on how the storage container is held during transportation, or the storage container may be stored vertically (with the photomask protective film placed put into the storage container and store the storage container upright), the storage container is deformed

When the adhesive material is deformed, there is a possibility of poor adhesion as described earlier

[0011] In addition, when the storage container is deformed, due to the design of the storage container, the photomask protection film rubs against the cover of the storage container, so dust is generated, and foreign matter may adhere to the photomask protection film.

[0012] Therefore, in order to make the storage container rigid, it is also considered to increase the thickness of the container, but the weight will increase, and it is presumed that the operability will be very poor.

[0013] In addition, even if ribs are provided to make the storage container rigid, the area is 1000 cm 2 The storage container for the above-mentioned large photomask protection film is not ideal because the number of unevenness increases on the storage container, and the cleanability and workability of checking whether foreign matter is adhered may deteriorate.

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