Method for purifying ultra-pure hydrofluoric acid

A purification method and hydrofluoric acid technology, applied in the field of electronic chemicals, can solve the problems of poor absorption performance of an absorption tower, low purity of hydrofluoric acid, low yield, etc., and achieve environmental protection production, improved product purity, and increased yield Effect

Active Publication Date: 2008-02-20
JIANGYIN RUNMA ELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The biggest disadvantage of this method is that the purity of hydrofluoric acid is not high, the output is low, the absorption performance of the absorption tower is poor, and part of the hydrofluoric acid gas that is not fully absorbed is discharged into the air and pollutes the environment.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Pass 330kg of industrial anhydrous hydrogen fluoride into the rectification kettle, replace the air in the rectification kettle with nitrogen, control the internal pressure of the rectification kettle to ≤0.1Mpa, then add 0.6kg of potassium permanganate solution, stir for 10 minutes, and stand still for 20 minutes. Then add 4kg of 30% by weight of hydrogen peroxide solution, stir for 10 minutes, and stand still for 20 minutes; then heat up to 60°C, and the hydrogen fluoride liquid is vaporized to generate purified hydrogen fluoride gas; the purified hydrogen fluoride gas that goes out of the rectifying kettle is passed into the cooler Cooling and filtering is carried out, and the purified hydrogen fluoride gas is converted into a gas-liquid phase critical state by lowering the temperature, so that a small amount of impurities remaining in it are separated, and the impurities are partly refluxed to the rectification kettle, and the purified hydrogen fluoride gas is obtaine...

Embodiment 2

[0022] Put 220kg of industrial anhydrous hydrogen fluoride liquid into the rectification kettle, replace the air in the rectification kettle with nitrogen, control the internal pressure of the rectification kettle to ≤0.1Mpa, then add 0.5kg of potassium permanganate solution, stir for 10 minutes, and stand still for 20 minutes , then add 2.7kg of 30% by weight hydrogen peroxide solution, stir for 10 minutes, and stand still for 20 minutes; then heat up to 80°C, and the hydrogen fluoride liquid will be vaporized to generate purified hydrogen fluoride gas; The cooler is used for cooling and filtering, and the purified hydrogen fluoride gas is converted into a gas-liquid phase critical state by cooling down, so that a small amount of impurities remaining in it can be separated, and the impurities are partly refluxed to the rectification tank, and purified again after cooling and filtering The hydrogen fluoride gas enters the absorption tower; deionized water is injected into the a...

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Abstract

The invention relates to a purifying method of ultrahigh pure hydrofluoric acid, comprising the technological steps as follows: filling industrial anhydrous hydrogen fluoride liquid into a rectifying still, and adding potassium permanganate with 0.16 to 1 percent weight, stirring, then stopping; after that, adding hydrogen peroxide with 0.16 to 1 percent weight, stirring, then stopping; heating up to 60 to 80 DEG C, the hydrogen fluoride liquid is gasified and generated into purified hydrogen fluoride gas; subsequently, filling the purified hydrogen fluoride gas which goes out of the rectifying still into a cooler for cooling and filtering; injecting deionized water into an absorption tower whose bottom is provided with a gas distribution plate tube, after that, filling the hydrogen fluoride gas which goes out of the cooler into the gas distribution plate tube at the bottom of the tower; after sprayed out of the gas distribution holes on the tube wall of the gas distribution plate tube, the hydrogen fluoride gas is absorbed by the deionized water and produced into semi finished product of hydrofluoric acid; finally, filling the semi finished product of hydrofluoric acid which goes out of the absorption tower into a filter in 0.05Mum, after that, obtaining the finished product of ultrahigh pure hydrofluoric acid. The product prepared by the method of the invention has high fineness and output, according to the requirements of the environmental protection.

Description

technical field [0001] The invention relates to a method for purifying ultrahigh-purity hydrofluoric acid. It belongs to the technical field of electronic chemicals. Background technique [0002] Hydrofluoric acid (hydrofluoric, HF), with a relative molecular weight of 20.1, is a colorless transparent liquid with strong acidity; it is strongly corrosive to metal and glass and is highly toxic. The hydrofluoric acid density (25° C.) was 1.13 g / ml (40% by weight). The ultra-high-purity hydrofluoric acid is a strong acid cleaning and corrosive agent, which can be used in conjunction with nitric acid, glacial acetic acid, hydrogen peroxide and ammonium hydroxide, and is mainly used in the production of VLSI process technology. [0003] The purification method of hydrofluoric acid commonly used at present is: use industrial anhydrous hydrogen fluoride to add potassium permanganate and then rectify and purify to obtain a kind of ultra-clean high-purity hydrogen fluoride. The big...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/19
Inventor 戈士勇
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL
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