Method for purifying high-yield superclean high-purity hydrofluoric acid

A purification method and technology of hydrofluoric acid, applied in the field of electronic chemicals, can solve the problems of poor absorption performance of absorption tower, low purity of hydrofluoric acid, low yield, etc. Effect

Inactive Publication Date: 2011-04-13
JIANGYIN RUNMA ELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The biggest disadvantage of this method is that the purity of hydrofluoric acid is not high, the output is low, the absorption performance of the absorption tower is poor, and part of the hydrofluoric acid gas that is not fully absorbed is discharged into the air and pollutes the environment.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Pass 330kg of industrial anhydrous hydrogen fluoride in the raw material tank into oxidation processor 1, replace the air in oxidation processor 1 with nitrogen, control the internal pressure of oxidation processor 1 to ≤0.1Mpa, then add 0.6kg of potassium permanganate solution, and stir for 10 minutes , stand still for 20 minutes, then the liquid in the oxidation processor one enters the oxidation processor two through the filter one, adds 4kg of 30% by weight hydrogen peroxide solution in the oxidation processor two, stirs for 10 minutes, stands still for 20 minutes, and then The liquid in the oxidation processor 2 enters the rectification tower through the filter 2, and then heats up to 60°C, the hydrogen fluoride liquid is vaporized to generate purified hydrogen fluoride gas; The temperature is lowered to convert the purified hydrogen fluoride gas into a gas-liquid critical state, so that a small amount of impurities that still exist in it are separated, and the impu...

Embodiment 2

[0023] Pass 220kg of industrial anhydrous hydrogen fluoride in the raw material tank into oxidation processor 1, replace the air in oxidation processor 1 with nitrogen, control the internal pressure of oxidation processor 1 to ≤0.1Mpa, then add 0.5kg of potassium permanganate solution, and stir for 10 minutes , stand still for 20 minutes, then pass the liquid in the oxidation processor one into the oxidation processor two through the filter one, add 2.7kg of 30% by weight hydrogen peroxide solution in the oxidation processor two, stir for 10 minutes, stand still for 20 minutes, and then The liquid in the oxidation processor 2 enters the rectification tower through the filter 2, and then heats up to 80°C, and the hydrogen fluoride liquid is vaporized to generate purified hydrogen fluoride gas; the purified hydrogen fluoride gas exiting the rectification tank is passed into a cooler for cooling and filtration Convert the purified hydrogen fluoride gas into a gas-liquid phase crit...

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PUM

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Abstract

The invention relates to a method for purifying high-yield superclean high-purity hydrofluoric acid, which comprises the following process steps of: introducing industrial anhydrous hydrogen fluoride into an oxidation treater A, adding potassium permanganate solution for oxidation, introducing the liquid in the oxidation treater A into an oxidation treater B through a filter A, oxidizing by using hydrogen dioxide solution, introducing the liquid into the oxidation treater B into a rectifying tower through a filter B, and gasifying hydrogen fluoride liquid to generate purified hydrogen fluoride gas; introducing the hydrogen fluoride gas out of the rectifying tower into a cooler for cooling and filtering; injecting deionized water into an absorption tower, arranging a distribution coil at the bottom of the absorption tower, introducing the hydrogen fluoride gas out of the cooler into the distribution coil at the bottom of the absorption tower, injecting from distribution holes on the upper and lower walls of the distribution coil, and absorbing by using the deionized water to prepare a hydrofluoric acid semi-finished product; and introducing the hydrofluoric acid semi-finished product out of the absorption tower into a 0.05 mu m filter to obtain the superclean high-purity hydrofluoric acid finished product. The product prepared by the method has high purity and yield, and meets environmental protection requirement.

Description

technical field [0001] The invention relates to a method for purifying ultra-clean and high-purity hydrofluoric acid with high yield. It belongs to the technical field of electronic chemicals. Background technique [0002] Hydrofluoric acid (hydrofluoric, HF), with a relative molecular weight of 20.1, is a colorless transparent liquid with strong acidity; it is strongly corrosive to metal and glass and is highly toxic. The hydrofluoric acid density (25° C.) is 1.13 g / ml (40% by weight). Ultra-clean and high-purity hydrofluoric acid is a strong acid cleaning and corrosive agent, which can be used in conjunction with nitric acid, glacial acetic acid, hydrogen peroxide and ammonium hydroxide, and is mainly used in the production of VLSI process technology. [0003] The purification method of hydrofluoric acid commonly used at present is: use industrial anhydrous hydrogen fluoride to add potassium permanganate and then rectify and purify to obtain a kind of ultra-clean high-pu...

Claims

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Application Information

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IPC IPC(8): C01B7/19
Inventor 戈士勇
Owner JIANGYIN RUNMA ELECTRONICS MATERIAL
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