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Inductance structure

A technology of inductance and wire electrical properties, applied in the field of inductance structure that can improve the Q value, can solve problems such as affecting the performance of the inductance, and achieve the effect of reducing the conductor loss and improving the Q value

Active Publication Date: 2010-06-02
VIA TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the known technology is applied to a symmetrical differential inductor, as the winding width increases, different degrees of coupling will occur between the two windings and the substrate in the inductor, which will affect the performance of the inductor.

Method used

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  • Inductance structure
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Examples

Experimental program
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Embodiment Construction

[0034] Figure 1A is a schematic top view of an inductor structure according to an embodiment of the present invention. Figure 1B is along Figure 1A The cross-sectional schematic diagram of the I-I' section line in the middle. Figure 1C is according to another embodiment of the present invention along the Figure 1A The cross-sectional schematic diagram of the I-I' section line in the middle.

[0035] Please also refer to Figure 1A and Figure 1B For example, the inductor structure 100 is disposed in the dielectric layer 104 on the substrate 102 . The inductor structure 100 includes a helical wire 106 , a helical wire 108 , and at least one gain pattern 130 . Wherein, the inductor structure 100 can be realized by semiconductor technology, and the substrate 102 is, for example, a silicon substrate. The material of the dielectric layer 104 is, for example, silicon oxide or other dielectric materials. The material of the helical wire 106 and the helical wire 108 can be me...

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Abstract

The utility model discloses an inductance structure on a substrate, which comprising a primary spiral wire, a secondary spiral wire and at least one gain pattern. Wherein, the primary spiral wire consists of a plurality of primary wires and binding wires between adjacent primary wires; the secondary spiral wire comprises a plurality of secondary wires and binding wires between adjacent secondary wires. The secondary spiral wire and the primary spiral wire are symmetrically arranged about a symmetrical plane; and cascaded to form a spiral loop structure with 2N turns, where N is a positive integer. The primary and the secondary binding wires are arranged in crisscross manner on the symmetrical plane and at different heights from the substrate giving 2N-1 nodes. The gain pattern is arrangedbelow the primary binding wire at the 2N-1st node from the outer ring and electrically connected with the corresponding primary binding wires.

Description

technical field [0001] The present invention relates to an inductor structure, and in particular to an inductor structure capable of improving Q value. Background technique [0002] Generally speaking, inductors are transformed through electromagnetic and have the function of storing and releasing energy. Therefore, inductors can be used as components for stabilizing current. Inductors have a wide range of applications. Inductors are often used in radio frequency (radio frequency, RF) circuits, voltage-controlled oscillators (VCO), low noise amplifiers (low noise amplifiers, LNA) or power amplifiers. (power amplifier, PA) and other products. In an integrated circuit, an inductor is an important but challenging passive component. As far as the performance of the inductor is concerned, the higher the quality of the inductor, the higher the quality factor (quality factor) of the inductor, represented by the Q value. The Q value is defined as follows: [0003] Q=ω×L / R [00...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01F17/00H01F27/28
Inventor 李胜源林筱筑
Owner VIA TECH INC