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Polarization phase shifting double shearing interference wave face measuring apparatus and inspect method thereof

A double shear, measuring instrument technology, applied in polarizing elements, measuring optics, measuring devices, etc., can solve the problems of difficult to measure accurately, cannot give the three-dimensional shape of the wavefront, etc., and achieve the effect of high sensitivity

Inactive Publication Date: 2008-03-12
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, the double-shear interferometric wavefront measuring instrument approximates the laser wavefront as a spherical wave to solve the laser wavefront, and it is difficult to accurately measure the laser wavefront other than the spherical wave
At the same time, the solution process of the wave surface can only give the maximum wave height of the wave surface, but cannot give the three-dimensional shape of the entire wave surface

Method used

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  • Polarization phase shifting double shearing interference wave face measuring apparatus and inspect method thereof
  • Polarization phase shifting double shearing interference wave face measuring apparatus and inspect method thereof
  • Polarization phase shifting double shearing interference wave face measuring apparatus and inspect method thereof

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Embodiment Construction

[0018] Please refer to FIG. 1 first. FIG. 1 is a schematic structural diagram of an embodiment of the polarization phase-shifting double-shear interferometric wavefront measuring instrument of the present invention. As shown in Figure 1, the polarization phase-shifting double-shear interference wave surface measuring instrument of the present invention consists of a first Yamin parallel plate 1, a wedge-shaped optical plate 2 on the left, an optical plate 3 on the left, a wedge-shaped optical plate 4 on the right, and an optical plate 5 on the right. , The second Yamin parallel plate 6, a quarter wave plate 7, an analyzer 8, an imaging mirror group 9, a CCD image sensor 10 and a computer 11.

[0019] The material and thickness of the first Yamin parallel plate 1 and the second Yamin parallel plate 6 are the same. The working face A of the first Yamin parallel plate 1 is the incident working face, and the polarizing beam splitting film is coated on the working face A, and the p...

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Abstract

The invention relates to a polarization phase-shifting double-shear interference wave surface measuring instrument and a detection method, wherein the measuring instrument orderly comprises a first Yamin parallel plate, a left lower wedge-shaped optical plate, a left upper wedge-shaped optical plate, a right lower wedge-shaped optical plate, a right upper wedge-shaped optical plate, a second Yamin parallel plate, a polarization phase shifter, an imaging mirror group and an image sensor along the forward direction of light beam, and the output end of the image sensor is connected with a computer. The invention not only keeps all characteristics of the double-shear interference wave surface measuring instrument, but also has the advantages of the high sensitivity, the accurate measurement of random symmetrical wave surfaces and the supply of complete wave surface profile.

Description

technical field [0001] The invention relates to laser detection, and is a polarization phase-shifting double-shear interferometric wavefront measuring instrument and its detection method, in particular a high-sensitivity double-shearing interferometric wavefront measuring instrument that can accurately measure any symmetrical wavefront and provide a complete wavefront profile . Background technique [0002] Highly collimated laser beams have been widely used in many laser application systems. For example, interstellar laser communication systems use highly collimated laser beams to transmit signals at distances of thousands of kilometers, and high-energy laser weapons output high collimated The laser beam can concentrate energy to attack the target. Highly collimated laser beams have high wavefront quality and small divergence. Usually, the wavefront error is close to the diffraction limit, which is about 0.3 times the wavelength. Ordinary wavefront sensors cannot accurate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J9/02G01B9/023G01B11/24G02B27/10G02B5/30
Inventor 王利娟刘立人栾竹孙建锋周煜
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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