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Chemical aluminum plating solution and chemical aluminum plating method

A technology of chemical plating and aluminum solution, applied in liquid chemical plating, metal material coating process, coating and other directions, can solve problems such as difficulty in uniform plating, and achieve the effect of excellent thermal conductivity and great practical value

Inactive Publication Date: 2008-07-02
凌国平
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, electroplating aluminum can only be carried out on the surface of conductive objects such as metals, and it is difficult to uniformly plate the surface of objects with complex shapes.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Example 1: Take 62.5ml of plating solution 1 in a general-purpose beaker, put the beaker into a temperature-controlled heater, keep the temperature of the plating solution at about 35°C, and then add the reducing agent LiH to the plating solution 1 while stirring, so that The reducing agent is dispersed in the plating solution to obtain electroless aluminum plating solution 1. The amount of reducing agent added is 1 mol (0.5 g) per liter of plating solution 1.

Embodiment 2

[0041] Embodiment 2: replace plating solution 1 with plating solution 2, other is the same as embodiment 1, obtains electroless aluminum plating solution 2 of the present invention.

Embodiment 3

[0042] Embodiment 3: replace plating solution 1 with plating solution 3, other is the same as embodiment 1, obtains electroless aluminum plating solution 3 of the present invention.

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PUM

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Abstract

The invention discloses a chemical aluminum plating solution and a chemical aluminum plating method. The chemical aluminum plating solution is composed of an aluminum-containing room-temperature molten salt and a reducer, wherein 0.05 to 2.5 mol reducer is contained in every liter of the aluminum-containing room-temperature molten salt. The method comprises the following steps of: soaking a workpiece to be plated in SnCl2 solution for sensitizing treatment, cleaning with water, and soaking in a PdCL2 solution for activation; or soaking a mixture solution containing SnCl2 and PdCl2 for activation; and chemically plating aluminum using the chemical aluminum plating solution in a dry inert atmosphere. According to the invention, aluminum can be separated out on the workpiece to be plated to achieve chemical aluminum plating by soaking the workpiece in the solution without electrifying. The invention can plate light-weight aluminum with excellent electrical conductivity and thermal conductivity not only on a metal base but also on an insulating workpiece to be plate. Moreover, the aluminum can be uniformly plated even for the workpiece with complex shape or for powder without considering the uniformity of current distribution since no electroplating is adopted. Accordingly, the invention has great practical value.

Description

technical field [0001] The invention relates to an aluminum plating technology, in particular to an electroless aluminum plating solution and an electroless aluminum plating method. technical background [0002] Since aluminum has a high affinity with oxygen, its redox potential is lower than that of hydrogen, so it is difficult to perform electroplating in aqueous solution. Therefore, non-aqueous solutions, especially organic solvents, are generally used as electroplating solutions for aluminum plating, but there are dangers of fire and explosion in organic solvent electroplating. For this reason, a molten salt aluminum plating solution without combustion hazard has been developed for aluminum plating, such as aluminum chloride-chlorination 1-methyl-3-ethylimidazole (AlCl 3 -EMIC) room temperature molten salt, aluminum chloride-n-butylpyridine chloride (AlCl 3 -BPC) room temperature molten salt, and aluminum chloride-quaternary ammonium salt ([(R 1 ) 3 N + R 2 ]X - ,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C18/31C23C18/18
Inventor 小浦延幸宇井幸一凌国平
Owner 凌国平
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