Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Roots dry type vacuum pump rotor capable of directly discharging to air and processing technique thereof

A dry vacuum pump and processing technology, applied in the direction of rotary piston pumps, pumps, rotary piston machines, etc., can solve the problems that cannot be used for IC equipment, difficult processing, large one-time investment, etc., to achieve favorable The effects of mass production, reduced processing costs, and reduced maintenance costs

Active Publication Date: 2008-07-02
SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
View PDF0 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] In order to overcome the disadvantages of the prior art that it is difficult to process, large one-time investment, and cannot be used for IC equipment, the purpose of the present invention is to provide a new type of IC equipment with simple processing technology, low cost, and strong versatility of parts. Roots Dry Vacuum Pump Rotor and Its Processing Technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Roots dry type vacuum pump rotor capable of directly discharging to air and processing technique thereof
  • Roots dry type vacuum pump rotor capable of directly discharging to air and processing technique thereof
  • Roots dry type vacuum pump rotor capable of directly discharging to air and processing technique thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] The present invention will be described in further detail below in conjunction with the embodiments and accompanying drawings.

[0042] For convenience, let me take this opportunity to explain the composition of the involute Roots-shaped rotor.

[0043] Involute is a type of line that is often used in rotor design. A pair of involutes with equal base circles and opposite extension directions is an ideal meshing curve. A schematic diagram of a pair of involute Roots rotors meshing see figure 2 .

[0044] Due to the self-symmetry of the Roots rotor, only 1 / 4 of its profile is studied, and other parts can be obtained according to the symmetry. Taking the rotor profile in the second quadrant as an example, the profile composition of the involute Roots rotor is shown in Table 1.

[0045] Table 1 Theoretical profiles of involute Roots rotors

[0046]

[0047] The theoretical profile of the involute Roots rotor can be derived from meshing principles and mathematical ca...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a design of a Roots pump, in particular to a rotor of a Roots dry vacuum pump which discharges directly into atmosphere and processing technology thereof. The processing technology substitutes a waist arc for an involute to design a rotor block, the rotor block is separately processed and then assembled with a spigot shaft. The processing steps are as follows: (1) processing the rotor block: a ductile cast iron bar is selected as roughcast; processing method: firstly processing the outer surface and the two end surfaces of the bar, incising the bar according to the thickness of the rotor block, then processing other two surfaces (outer circular surface and inner circular surface) of the rotor block, finally incising the bar into the rotor block with needed thickness according to application requirements; (2) joining two rotor blocks and a pin roll into a whole via a pin hole. The invention has the advantages of simple processing technology, low cost, high versatility of parts, suitability for IC equipments, etc.

Description

technical field [0001] The invention relates to the design of a Roots pump, in particular to a rotor of a Roots dry vacuum pump directly exhausting the atmosphere and its processing technology. Background technique [0002] The IC equipment industry is an important industry in the national development strategy. In the IC equipment industry, 70% of the work needs to be carried out in a vacuum environment with strict cleanliness requirements, such as chemical vapor deposition, ion implantation, evaporation, sputtering, epitaxial growth, etching, packaging, testing, etc. In every IC production line, a large number of dry vacuum obtaining equipment for obtaining and maintaining a clean vacuum environment are applied. Taking a mid-range process IC production line with a monthly output of 25,000 8-inch wafers as an example, it usually requires thousands of dry vacuum pumps, and the investment accounts for about 20% of the equipment investment. As one of the key equipment of IC e...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): F04C18/14F04C25/02
CPCF05C2201/0442
Inventor 王光玉张振厚刘坤秦柏林
Owner SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com