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Processing equipment and method for waste gases in semiconductor production process

A technology for waste gas treatment and waste gas, which is applied in separation methods, chemical instruments and methods, and dispersed particle separation, etc., and can solve problems such as being unsuitable for low-cost and large-scale production.

Inactive Publication Date: 2008-08-06
BEIJING XINGZHE MULTIMEDIA TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional silane processing equipment is not suitable for low-cost and high-volume production of silicon-based devices, including large-area optoelectronic devices based on silicon thin-film substances

Method used

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  • Processing equipment and method for waste gases in semiconductor production process
  • Processing equipment and method for waste gases in semiconductor production process

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Embodiment Construction

[0015] Such as figure 1 As shown in , the heart of the invention is a coal fired furnace system 6 comprising a furnace wall 60, exhaust gas inlet 17 and air inlet 67, exhaust gas outlet 68, a device 65 including a bottom door for discharging and collecting coal ash. Furnace wall 60 is filled with coal 66, preferably porous briquettes, briquettes or briquettes, to allow gases to pass through the high temperature combustion zone. The intervals between uniformly distributed passages in the coal material (such as holes in coal bricks) should not be too wide, otherwise it will hinder the full contact and complete reaction of the exhaust gas passing through and the burning coal. Coal ash first forms at the bottom of the furnace, where it is pushed down by the gravity of the coal charge 66 . The air inlet 67 can provide an adjustable opening to control the flow of air applied to the combustion zone, thus controlling the reaction rate in the coal furnace. An air filter is provided a...

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PUM

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Abstract

The invention discloses a novel device used for treating silane by using a coal stove and a method thereof, which can be applied to a process of semiconductor production. The method of the invention is as follows: perforated lump coals in the coal stove are replaced and added regularly. The waste gas discharged by a coating enters a burning area, and the materials containing silicon is heat-deposited on the surface of the burning coal, or reacted with oxygen to generate silicon dioxide to gather on the surface of the coals. The novel device and the method provided by the invention are characterized mainly in that waste gas can be processed effectively and reliably for a vacuum coating system with incomparable low cost.

Description

technical field [0001] The invention describes equipment and methods for treating waste gas in the semiconductor production process, and in particular relates to a method for treating silane (SiH 4 ) apparatus and method for waste gas, relates to a device and method for safely and efficiently treating silane waste gas generated during large-scale vacuum processing of silicon-based electronic and optoelectronic devices with relatively low cost. Background technique [0002] Vacuum processing equipment is widely used in large-scale manufacturing of silicon-based semiconductor devices, such as integrated circuits and solar cells, including large-area photovoltaic components based on silicon thin films. Chemical Vapor Deposition (CVD) and Chemical Vapor Etching are currently more popular technical means for making the referred products. For example, polysilicon or silicon dioxide layers in integrated circuits can be 4 The gas or other similar gas is deposited by chemical vapor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D53/46B01D53/76
Inventor 李沅民马昕
Owner BEIJING XINGZHE MULTIMEDIA TECH
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