Multi-angle perpendicular reflector preparation method and product
A technology of vertical reflection and manufacturing method, applied in the direction of mirrors, etc., can solve the problems of limiting the performance and application field of mirror surface, not having multi-angle reflection, etc., to achieve strong portability and adaptability, improve performance and application fields, and improve device performance Effect
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[0025] Such as figure 1 , figure 2 As shown, in the prior art, due to the limitation of the deep etching process, only a reflective mirror surface 1 with a single vertical angle can be produced on the same vertical side wall, and there are many factors affecting the side wall morphology in the deep etching process, such as : Ion source power, wafer stage power, gas flow, reaction pressure, etching time, passivation time, etching and passivation overlap time, etc. Due to the influence of many factors, it is necessary to comprehensively consider and optimize multiple conditions when manufacturing the desired surface morphology of the mirror on the side wall.
[0026] Aiming at the above factors, the present invention finally obtains and optimizes a new type of deep etching process principle through repeated comparison and analysis of theoretical derivation and experimental results, that is, mainly to change the ratio of etching time to passivation time, and to adjust other etc...
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