Multi-angle perpendicular reflector preparation method and product

A technology of vertical reflection and manufacturing method, applied in the direction of mirrors, etc., can solve the problems of limiting the performance and application field of mirror surface, not having multi-angle reflection, etc., to achieve strong portability and adaptability, improve performance and application fields, and improve device performance Effect

Inactive Publication Date: 2008-09-17
PEKING UNIV
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Problems solved by technology

At present, vertical mirrors are generally manufactured by bulk silicon deep etching process. Limited by design principles and process technology, only reflective mirrors with a single vertical angle can be manufactured on the same vertical side wall (such as figure 1 , figure 2 shown), so the mirror does not have the ability to achieve multi-angle reflection in the vertical direction, thus limiting the performance and application fields of the mirror

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  • Multi-angle perpendicular reflector preparation method and product
  • Multi-angle perpendicular reflector preparation method and product
  • Multi-angle perpendicular reflector preparation method and product

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Embodiment Construction

[0025] Such as figure 1 , figure 2 As shown, in the prior art, due to the limitation of the deep etching process, only a reflective mirror surface 1 with a single vertical angle can be produced on the same vertical side wall, and there are many factors affecting the side wall morphology in the deep etching process, such as : Ion source power, wafer stage power, gas flow, reaction pressure, etching time, passivation time, etching and passivation overlap time, etc. Due to the influence of many factors, it is necessary to comprehensively consider and optimize multiple conditions when manufacturing the desired surface morphology of the mirror on the side wall.

[0026] Aiming at the above factors, the present invention finally obtains and optimizes a new type of deep etching process principle through repeated comparison and analysis of theoretical derivation and experimental results, that is, mainly to change the ratio of etching time to passivation time, and to adjust other etc...

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Abstract

The invention relates a method for manufacturing a multi-angle normal reflection mirror surface and a product. The inventive method carries out deep etching by using a bulk silicon lateral wall as a carrier, mainly changing the ratio of etching time to passivating time, and giving attention to the adjustment on other etching conditions. The invention solves the difficult problem worldwide of manufacturing a single-angle normal reflection mirror surface only on the same vertical lateral wall, the micro-optic device structure in the mirror surface structure can realize a plurality of optic treatment on the same lateral wall, a series of widely used multifunctional MEMS devices can be easily developed, thereby greatly improving the device capability, the integration level and the production efficiency, and further greatly improving the capabilities and the application fields of the MEMS devices. The inventive novel mirror surface manufacturing process has compatibility with most prior vertical mirror surface manufacturing processes, strong portability and adaptability. The method can be widely used in micro-electromechanical systems.

Description

technical field [0001] The invention relates to a manufacturing method and product of a reflecting mirror, in particular to a manufacturing method and product of a multi-angle vertical reflecting mirror. Background technique [0002] Micro-Electro-Mechanical Systems (MEMS) have broad application prospects in national defense and civilian fields, and are now attracting much attention as an emerging technology. Micromirrors fabricated on the vertical side walls of silicon wafers, as key components for micro-operation of optical signals, have been widely used in important fields such as all-optical communication, biological detection, imaging projection, and inertial guidance, and have become the core of optical micro-electromechanical systems. structure. At present, vertical mirrors are generally manufactured by bulk silicon deep etching process. Limited by design principles and process technology, only reflective mirrors with a single vertical angle can be manufactured on th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/12G02B5/08
Inventor 陈庆华吴文刚王子千邹积彬闫桂珍郝一龙王阳元
Owner PEKING UNIV
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