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Atomic layer deposition device and Atomic layer deposition method

An atomic layer deposition and conveying device technology, applied in coating, transportation and packaging, metal material coating process, etc., can solve the problems of raw material waste, low output efficiency, inability to reduce costs, etc., to reduce costs and waste. , the effect of shortening the time

Inactive Publication Date: 2008-12-31
PROMOS TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Another object of the present invention is to provide an atomic layer deposition method, which is used to improve the problem of low output efficiency caused by the complex process of traditional atomic layer deposition, and to improve the traditional atomic layer deposition process.

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  • Atomic layer deposition device and Atomic layer deposition method
  • Atomic layer deposition device and Atomic layer deposition method
  • Atomic layer deposition device and Atomic layer deposition method

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Embodiment Construction

[0050] In order to make the above and other purposes, features, advantages and embodiments of the present invention more comprehensible, the detailed descriptions are as follows with reference to the accompanying drawings:

[0051] An atomic layer deposition apparatus according to an embodiment of the present invention includes a conveying device, a reaction chamber, and a plurality of wafer stages.

[0052] The conveying device has a conveying path, and the conveying path can be a circular path or a conveying belt. The reaction chamber has an entry port (inlet port) and an exit port (exit port), and at least one partition is provided to divide the reaction chamber into multiple sub-reaction chambers, and each sub-reaction chamber is arranged in sequence along the delivery path. The inlet port and the outlet port communicate with one of the secondary reaction chambers respectively. According to a specific embodiment of the present invention, the inlet port communicates with th...

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Abstract

The invention relates to an atomic layer deposition device and an atomic layer deposition method, the atomic layer deposition device comprises a reaction chamber provided with a plurality of secondary reaction chambers, a conveying apparatus and a plurality of wafer carriers, the secondary reaction chambers are arranged on a conveying path, the conveying apparatus conveys the plurality of wafer carriers along the conveying path, so each wafer carrier can be relatively matched with each secondary reaction chamber sequentially to form the closed reaction environment. Wherein, each secondary reaction chamber is respectively kept with a chemical atmosphere state suitable for reaction, and each wafer to be deposited is sequentially utilized to complete the atomic layer deposition process with different steps through different atmospheres matched in each secondary reaction chamber.

Description

technical field [0001] The present invention relates to an atomic layer deposition device and an atomic layer deposition method, in particular to a method for completing atomic layer deposition by means of a deposition device having multiple sub-reaction chambers with different chemical atmospheres. Background technique [0002] Atom layer deposition (ALD) is a chemical vapor deposition (Chemical vapor deposition; CVD), which is characterized in that the wafer to be deposited is exposed to two or more types of Under the atmosphere of the precursor gas with complementary characteristics, the self-limiting (self-limiting) reaction characteristics are used to perform selective chemical adsorption on the wafer surface to grow a very uniform atomic-level thin film, according to the required film thickness and different characteristics, the process steps of atomic layer deposition are repeated. [0003] However, before different reaction atmospheres are introduced into the deposi...

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Application Information

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IPC IPC(8): C23C16/00C23C16/52H01L21/205H01L21/365H01L21/677
Inventor 李名言吴孝哲蔡文立
Owner PROMOS TECH INC