Photomask data generation method, photomask generation method, exposure method, and device manufacturing method

A technology of original and data, applied in the field of original data generation, can solve the problem of not discussing the method of exposure equipment output

Active Publication Date: 2009-01-28
CANON KK
View PDF1 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Although Japanese Patent Application Laid-Open Publication No. 2004-221594 discusses an auxiliary pattern arranging method for improving the depth of focus and...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
  • Photomask data generation method, photomask generation method, exposure method, and device manufacturing method
  • Photomask data generation method, photomask generation method, exposure method, and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Various exemplary embodiments, features, and aspects of the invention will now be described in detail with reference to the accompanying drawings. The relative arrangement of components, numerical expressions, and numerical values ​​set forth in these examples are not intended to limit the scope of the present invention unless explicitly stated.

[0025] Concepts according to exemplary embodiments of the present invention may be expressed as hardware or placed in a mathematical model. Accordingly, the exemplary embodiments of the present invention can be installed in a computer system as a program.

[0026] The software function of the computer system according to the present exemplary embodiment includes a program having a computer-executable program code, and can determine a pattern of a mask as a master, generating master data. The software codes may be stored as one or more modules on at least one storage medium such as a machine readable medium or a memory. Exemp...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present invention relates to a photomask data generation method, photomask generation method, exposure method, and device manufacturing method. A method for generating original plate data includes calculating a two-dimensional transmission cross coefficient based on a function indicating an intensity distribution of light formed on a pupil plane of a projection optical system with illumination light and a pupil function for the projection optical system, calculating an approximate aerial image obtained by approximating an aerial image on an image plane of the projection optical system by at least one component of a plurality of components of the aerial image based on the two-dimensional transmission cross coefficient and a first pattern on an object plane of the projection optical system, generating a further pattern having the first pattern on the object plane and auxiliary patterns based on the approximate aerial image, and generating original plate data including a pattern generated by repeating the calculating and generating processing by using the further pattern as the first pattern on the object plane.

Description

technical field [0001] The present invention generally relates to master data generation methods, master generation methods, exposure methods, and device manufacturing methods. Background technique [0002] Exposure equipment is used in photolithography processes for manufacturing semiconductor devices such as integrated circuits (ICs). The exposure equipment illuminates the original plate (also called “mask” or “reticle”), and exposes the circuit pattern drawn on the original plate onto the substrate (wafer) through the projection optical system. [0003] It is desired to simplify the semiconductor device manufacturing process and improve the performance of exposure equipment. [0004] In the exposure equipment, as an index of the performance of the exposure equipment, resolution indicating how fine a pattern can be formed on a substrate, and throughput indicated by the number of substrates that can be fully exposed per unit time are used. As a method for improving the th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G03F1/14G03F7/20H01L21/027G03F1/68G03F1/70
CPCG03F1/36G03F1/144G03F7/70441
Inventor 山添贤治
Owner CANON KK
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap