Method and device for quickly determining light intensity distribution based on mask graphics processing

A technology of light intensity distribution and graphics processing, which is applied in the direction of photolithographic exposure devices, electrical digital data processing, and special data processing applications, etc. It can solve the problems of large volume of convolution calculation data, a large amount of calculation time, and reduced lithography efficiency. , to avoid double calculation, reduce calculation time and improve efficiency

Active Publication Date: 2019-01-08
MOYAN COMPUTATIONAL SCI NANJING PTE LTD
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Problems solved by technology

[0005] This application provides a method and device for quickly determining light intensity distribution based on mask pattern processing, which can be used to solve the problem in related technologies t

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  • Method and device for quickly determining light intensity distribution based on mask graphics processing
  • Method and device for quickly determining light intensity distribution based on mask graphics processing
  • Method and device for quickly determining light intensity distribution based on mask graphics processing

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Embodiment Construction

[0040] In order to enable those skilled in the art to better understand the technical solutions in the embodiments of the present application, and to make the above-mentioned purposes, features and advantages of the embodiments of the present application more obvious and understandable, the technical solutions in the embodiments of the present application are described below in conjunction with the accompanying drawings The program is described in further detail.

[0041] In the method provided in the embodiment of the present application, the execution subject of each step may be a terminal. The terminal is used for lithography calculations during lithography to optimize and control lithography.

[0042] figure 1 It is a flow chart of a method for quickly determining light intensity distribution based on reticle pattern processing according to an exemplary embodiment. The method may include the following steps.

[0043] Step 101, establish a cross transfer function accordi...

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Abstract

The present application discloses a light intensity distribution fast determination method and device based on mask graphics processing. The method comprises the following steps of: establishing a cross transfer function according to a light source function and a pupil function; Performing singular value decomposition on the cross transfer function to obtain at least one frequency domain kernel function; Determining at least one rectangle into which the mask pattern is divided, and characteristic information of each rectangle in the at least one rectangle; Determining a rectangular projectioncoefficient corresponding to each rectangle and a kernel function projection coefficient corresponding to each kernel function in at least one frequency domain; According to the rectangular projectioncoefficients, the kernel projection coefficients and the characteristic information of each rectangle, the light intensity distribution at the specified position of the user is determined. In the present application, the light intensity distribution is quickly determined by the kernel function projection coefficient and the rectangular projection coefficient. Due to the existence of repetitive rectangles in the rectangles divided by the mask pattern, repetitive calculation can be avoided when calculating the rectangular projection coefficients, the calculation time can be reduced, and the lithographic efficiency can be improved.

Description

technical field [0001] The present application belongs to the technical field of semiconductor lithography, and in particular relates to a method and device for quickly determining light intensity distribution based on mask pattern processing. Background technique [0002] With the improvement of factors related to industrial production technology, integrated circuit devices are getting smaller and smaller, and the integration of chips is getting higher and higher, which reduces the manufacturing cost of devices related to smart devices. In the current social life, the use of smart devices makes integrated circuits closely related to current life. In the industrial production of integrated circuits, photolithography technology uses the principle of photochemical reaction to transfer the previously designed pattern on the mask plate to an imaging plane (wafer), which is an inevitable process. [0003] Logic devices and storage devices in integrated circuit devices are quite ...

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Application Information

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IPC IPC(8): G03F7/20G06F17/50
CPCG03F7/70508G03F7/7055G06F30/30G06F30/367
Inventor 阎江梁文青
Owner MOYAN COMPUTATIONAL SCI NANJING PTE LTD
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