Method for detecting light intensity distribution of gradient filter and method for enhancing consistency of line width

Abstract

The invention relates to a method for detecting the light intensity distribution of a gradient filter. The method comprises the following steps: providing a mask plate with patterns of the same line width; providing a semiconductor substrate with a photosensitive material layer and transferring the patterns on the mask plate to the photosensitive material layer by using an exposure device to form photosensitive material layer patterns; measuring the line widths of the photosensitive material layer patterns in different positions of the semiconductor substrate to obtain the line width distribution of the photosensitive material layer patterns; applying the line width distribution of the photosensitive material layer patterns to the functional relationship between the light intensity distribution and the line width distribution of the gradient filter of the exposure device, to obtain the light intensity distribution of the gradient filter. The invention also provides a method for improving the line width consistency of the photolithography. The method has the advantages of simple operation, saving-time and low cost.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method for detecting the light intensity distribution of a gradient filter (Gradient Filter) of an exposure device in a photolithography process and a method for improving the line width consistency of the photolithography process. Background technique [0002] The semiconductor manufacturing process forms integrated circuits on semiconductor wafers through a series of processes such as deposition, photolithography, etching, ion implantation, chemical mechanical polishing, and cleaning. Among them, the photolithography process is used to define the area for etching and ion implantation, and plays a pivotal role in the semiconductor manufacturing process. The level of photolithography process determines the level of integration of semiconductor manufacturing process. With the development of the semiconductor manufacturing process towards the direction of sma...

AI Technical Summary

Problems solved by technology

When using this detection method to detect the light intensity distribution of the gradient filter, the exposure equipment needs to stop working, and the detector needs to be intervened, which is complicated and time-consuming; especially in mass-produced manufacturing plants, the filter needs to be periodically detected , which takes up a lot of time for the normal delivery of the exposure machine and increases the manufacturing cost

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