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Photomask manufacturing method, pattern copy method, photomask and data base

A manufacturing method, pattern data technology, applied in the photoengraving process of the pattern surface, the original for photomechanical processing, the manufacture of semiconductor/solid state devices, etc.

Active Publication Date: 2009-03-11
HOYA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the area of ​​the grayscale part becomes small, due to the influence of the light-shielding part or the light-transmitting part adjacent to the grayscale part, the above-mentioned transmittance will become the transmittance inherent in the semi-transparent film during actual exposure. When the transmittance is different, the transmittance inherent to the semi-transparent film cannot be treated as an effective value

Method used

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  • Photomask manufacturing method, pattern copy method, photomask and data base
  • Photomask manufacturing method, pattern copy method, photomask and data base
  • Photomask manufacturing method, pattern copy method, photomask and data base

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Embodiment Construction

[0084] Hereinafter, the best mode for carrying out the present invention will be described.

[0085] [Summary of Manufacturing Method of Photomask Related to the Present Invention]

[0086] According to the method for producing a photomask of the present invention, whenever a photomask having a predetermined pattern is used on a transparent substrate to be copied (a desired film is formed on a glass substrate or the like and covered with a resist film) ) When using an exposure device for exposure, the pattern copied on the object to be copied is predicted based on the light intensity distribution captured by the imaging unit through the exposure in the exposure device, and the photomask is manufactured based on this prediction method.

[0087] More specifically, it includes a method of making exposure conditions simulating the exposure conditions in the exposure device, and making a pattern similar to a pattern reproduced on the object to be reproduced by exposure performed o...

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Abstract

The invention provides a method of manufacturing a photo mask, comprising a procedure of using an exposing unit reappearing emulating exposure condition of exposure condition, testing the exposure on the test mask formed with specified pattern, and obtaining the transmissive light pattern of the tested mask by the image unit, and obtaining the transmissive light pattern data by the obtained transmissive light pattern; and a procedure of obtaining the effective transmission rate according to the the transmissive light pattern data under the exposure condition; and ensuring the shape of the region, and the material or film thickness forming the film on the region according to the effective transmission rate.

Description

technical field [0001] The present invention relates to a photomask manufacturing method, a pattern replication method, a photomask, and a database for manufacturing photomasks used in the manufacture of electronic components, and more particularly, to designing light by simulating effective transmittance A photomask manufacturing method for a mask, a pattern replication method, a photomask, and a database. The present invention also particularly relates to a multi-grayscale photomask (hereinafter, also referred to as a gray-tone (gray-tone) mask) having a light-shielding portion, a light-transmitting portion, and a translucent portion through which a part of the exposure light passes. A photomask manufacturing method, a photomask, a pattern replication method, and a database for designing a pattern shape of a semi-transparent portion, and designing a film thickness and a film material of a semi-transparent film. [0002] Also, as an electronic component is a display device r...

Claims

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Application Information

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IPC IPC(8): G03F1/00G03F1/14G01N21/59G03F1/54G03F1/68G03F1/84H01L21/336H01L29/786
CPCG03F1/32G03F1/84G03F7/70666
Inventor 吉田光一郎井村和久
Owner HOYA CORP
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