Photocatalyst solution for removing glue and method for removing glue at surface of liquid light-sensitive resin letterpress

A technology of photosensitive resin and photocatalyst, which is applied in the field of removing the surface stickiness of liquid photosensitive resin letterpress, and the field of photocatalyst solution for liquid photosensitive resin letterpress surface detackification, which can solve the problems of poor ability to transfer PI liquid, easy adhesion of dust, and uniform printing In order to improve the ability to transfer PI liquid, improve the uniformity of printing, and enhance the effect of photoreaction

Active Publication Date: 2009-03-25
深圳清溢光电股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the embodiments of the present invention is to provide a photocatalyst solution for detackification to solve the problem that the surface of the liquid photosensitive resin letterpress is too viscous, easy to adhere to dust, difficult to clean, and the ability to transfer PI liquid during the PI printing process Poor, poor printing uniformity

Method used

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  • Photocatalyst solution for removing glue and method for removing glue at surface of liquid light-sensitive resin letterpress
  • Photocatalyst solution for removing glue and method for removing glue at surface of liquid light-sensitive resin letterpress

Examples

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Embodiment 1

[0013] Take a certain amount of benzophenone and dissolve it in isopropanol, prepare a photocatalyst with a concentration of 0.1wt%, and coat it on the liquid photosensitive resin, using an ultraviolet light source with a wavelength of 254nm, at a light intensity of 60mw / cm 2 The surface of the letterpress was irradiated under certain conditions, and the surface tension was tested under different detackification times. See Table 1 for specific data.

Embodiment 2

[0015] Dissolve a certain amount of benzophenone in isopropanol, prepare a photocatalyst with a concentration of 0.5wt%, and coat it on the surface of the liquid photosensitive resin relief, using an ultraviolet light source with a wavelength of 254nm, at a light intensity of 60mw / cm 2 The surface of the letterpress was irradiated under certain conditions, and the surface tension was tested under different detackification times. See Table 1 for specific data.

Embodiment 3

[0017] Take a certain amount of benzophenone and dissolve it in isopropanol, prepare a photocatalyst with a concentration of 1wt%, and coat it on the surface of the liquid photosensitive resin relief, using an ultraviolet light source with a wavelength of 254nm, at a light intensity of 60mw / cm 2 The surface of the letterpress was irradiated under certain conditions, and the surface tension was tested under different detackification times. See Table 1 for specific data.

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Abstract

The present invention provides a photocatalyst solution for viscosity removal and a method for the viscosity removal of the surface of a liquid light-sensitive resin relief printing plate. The solute of the solution is benzophenone or alkyl derivative thereof, while the solvent is alcohol, aether or chloroform and the concentration of the solution is between 0.1 and 8 weight percent. The viscosity removal method comprises the following steps: (1) preparing the photocatalyst solution, wherein the solute is the benzophenone or the alkyl derivative thereof, while the solvent is the alcohol, the aether or the chloroform and the concentration of the solution is between 0.1 and 8 weight percent; and (2) coating the photocatalyst solution in the first step on the surface of the relief printing plate, and removing viscosity under ultraviolet light. With the photocatalyst solution for viscosity removal, the photoreaction effect is improved, the viscosity on the surface of the relief printing plate is prominently reduced, the capacity of transferring PI solution in the PI printing process is enhanced, and the uniformity of the printing is improved.

Description

technical field [0001] The invention relates to a photocatalyst solution, in particular to a photocatalyst solution for removing stickiness on the surface of a liquid photosensitive resin relief, and a method for removing the stickiness on the surface of a liquid photosensitive resin relief using the solution. Background technique [0002] At present, liquid photosensitive resin letterpress (referred to as liquid plate) is mainly used in the PI (polyimide) printing process of LCD (Liquid Crystal Display) manufacturers' medium and high-end products STN (Super Twisted Nematic) and color-STN. The main component of the liquid resin raw material used is unsaturated polybutadiene resin (Unsaturated Polybutadiene Resin). The process method is to coat the resin on a special exposure equipment, and first cure and shape it after selective exposure, and then wash the plate. , drying, light treatment, post-exposure and other processes determine the final size and performance of the prod...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/26G03F7/42B01J31/02
Inventor 贾伟喜
Owner 深圳清溢光电股份有限公司
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