Liquid photosensitive resin letterpress surface detackification method

A photosensitive resin and liquid technology, which is applied in photosensitive material processing, chemical instruments and methods, semiconductor/solid device manufacturing, etc., can solve problems such as poor ability to transfer PI liquid, easy adhesion of dust, poor printing uniformity, etc., to achieve The ability to transfer PI liquid is enhanced, the printing uniformity is improved, and the effect of enhancing the light reaction effect

Active Publication Date: 2011-12-14
深圳清溢光电股份有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the embodiments of the present invention is to provide a photocatalyst solution for detackification to solve the problem that the surface of the liquid photosensitive resin letterpress is too viscous, easy to adhere to dust, difficult to clean, and the ability to transfer PI liquid during the PI printing process Poor, poor printing uniformity

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Liquid photosensitive resin letterpress surface detackification method
  • Liquid photosensitive resin letterpress surface detackification method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0013] Take a certain amount of benzophenone and dissolve it in isopropanol, prepare a photocatalyst with a concentration of 0.1wt%, and coat it on the liquid photosensitive resin, using an ultraviolet light source with a wavelength of 254nm, at a light intensity of 60mw / cm 2 The surface of the letterpress was irradiated under certain conditions, and the surface tension was tested under different detackification times. See Table 1 for specific data.

Embodiment 2

[0015] Dissolve a certain amount of benzophenone in isopropanol, prepare a photocatalyst with a concentration of 0.5wt%, and coat it on the surface of the liquid photosensitive resin relief, using an ultraviolet light source with a wavelength of 254nm, at a light intensity of 60mw / cm 2 The surface of the letterpress was irradiated under certain conditions, and the surface tension was tested under different detackification times. See Table 1 for specific data.

Embodiment 3

[0017] Take a certain amount of benzophenone and dissolve it in isopropanol, prepare a photocatalyst with a concentration of 1wt%, and coat it on the surface of the liquid photosensitive resin relief, using an ultraviolet light source with a wavelength of 254nm, at a light intensity of 60mw / cm 2 The surface of the letterpress was irradiated under certain conditions, and the surface tension was tested under different detackification times. See Table 1 for specific data.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
surface tensionaaaaaaaaaa
Login to view more

Abstract

The invention provides a method for detackifying the surface of a liquid photosensitive resin letterpress, the method comprising the steps of: (1) configuring a photocatalyst solution, wherein the solute is benzophenone and its hydrocarbon derivatives, and the solvent is alcohol, ether or chloroform, The concentration is 0.1wt%-8wt%; (2) in the coating step (1), the photocatalyst solution is placed on the surface of the letterpress, and the ultraviolet light is used to detack. Adopting the photocatalyst solution of the present invention for detackification enhances the photoreaction effect, significantly reduces the viscosity of the letterpress plate, enhances the ability to transfer PI liquid during the PI printing process, and improves the printing uniformity.

Description

technical field [0001] The invention relates to a method for tackifying the surface of a liquid photosensitive resin relief. Background technique [0002] At present, liquid photosensitive resin letterpress (referred to as liquid plate) is mainly used in the PI (polyimide) printing process of LCD (Liquid Crystal Display) manufacturers' medium and high-end products STN (Super Twisted Nematic) and color-STN. The main component of the liquid resin raw material used is unsaturated polybutadiene resin (Unsaturated Polybutadiene Resin). The process method is to coat the resin on a special exposure equipment, and first cure and shape it after selective exposure, and then wash the plate. , drying, light treatment, post-exposure and other processes determine the final size and performance of the product. [0003] According to the surface characteristics of the printing material (PI liquid) and substrate (ITO glass) used in the LCD industry, the surface tension of the liquid plate us...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/26G03F7/42B01J31/02
Inventor 贾伟喜
Owner 深圳清溢光电股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap