Embedded type common basal plane two-dimension balance double-drive double-workpiece platform positioning system

Abstract

An embedded cobasis plane two-dimension balance double-drive double-workpiece platform positioning system belongs to the technical field of semiconductor manufacturing equipment; two X-direction single-plate linear motor stators arranged in parallel are embedded between a workpiece platform A and a workpiece platform B on a base station along X direction; the two X-direction single linear motor stators are respectively matched with X-direction single-plate linear motor active cells on the workpiece platform A and the workpiece platform B in sequence; the upper surface of the X-direction single-plate linear motor stators is in parallel with the datum plane of the base station and is embedded in the groove of the base station; connection material is filled all around the X-direction single-plate linear motor stators. The system of the invention avoids the vibration and instability of the workpiece platform caused by center of mass offset generated by single scan and inertia torque change generated by unilateral variable-speed drive, the structure is simplified, the rigidity is enhanced and the reliability is improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, in particular to an embedded common-base two-dimensional balanced double-drive double-workpiece positioning system. Background technique [0002] The workpiece table technology is one of the three core technologies of the objective lens, alignment, and workpiece table of the lithography machine. In the photolithography process, the process of transferring the pattern on the mask to the wafer includes: loading, pre-alignment, alignment, exposure and unloading processes. These processes require the movement of the workpiece table, especially During the exposure process, whether it is step-and-repeat exposure or step-scan exposure, very high requirements are placed on the movement speed, stability and accuracy of the workpiece table movement and positioning. Therefore, the speed, stability and positioning accuracy of the workpiece table directly affect the production e...

AI Technical Summary

Problems solved by technology

[0004] In order to overcome the deficiencies in the above-mentioned prior art, the present invention proposes an embedded common-base two-dimensional balanced dual-drive dual-workpiece stage positioning system, which can make the exposure process and pretreatment process of the workpiece stage be carried out separately at the same time, It can also effectively avoid the problems of complex structure, poor structural rigidity, many error links and low reliability existing in existing devices.

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