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Polymer resin composition

A resin composition and a polymeric technology, which is applied in the field of polymeric resin compositions, can solve problems such as insufficient coating or pattern transmittance

Active Publication Date: 2009-05-20
SUMITOMO CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Conventional compositions have sufficient sensitivity to light of wavelengths around 436nm, around 408nm, and around 365nm, but sometimes cannot sufficiently obtain the transmittance of the coating film or pattern obtained from the composition

Method used

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  • Polymer resin composition
  • Polymer resin composition
  • Polymer resin composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0232] [Synthesis of Polymeric Resin Composition 1]

[0233] Mix 153 parts of a solution of resin Aa (50 parts in terms of solid content), 50 parts of dipentaerythritol hexaacrylate (KAYARADDPHA; manufactured by Nippon Kayaku Co., Ltd.) (B), 4 parts of 2,2'-bis(2-chlorobenzene base)-4,4',5,5'-tetraphenyl-1,2'-diimidazole (B-CIM; manufactured by Hodogaya Chemical Co., Ltd.) (C), 1 part of 9,10-dibutyl Oxyanthracene (DBA; manufactured by Kawasaki Chemical Co., Ltd.) (D), 3 parts of pentaerythritol tetrathiopropionate (PEMP; manufactured by Sakai Chemical Industry Co., Ltd.) (T), 88 parts of 3-ethoxyethyl Propionate (D), 5 parts of 3-methoxy-1-butanol (D), and 65 parts of 3-methoxybutyl acetate (D), to obtain polymerizable resin composition 1.

[0234] [Creation of pattern 1]

[0235] A 2-inch square glass substrate (#1737; manufactured by Corning) was washed sequentially with a neutral detergent, water, and alcohol, followed by drying. On the glass substrate, at 200mJ / cm 2 T...

Embodiment 2

[0242] It carried out similarly to Example 1, it became the composition shown in Table 1, and the polymeric resin composition 2 and the pattern 2 were obtained.

Embodiment 3

[0244] It carried out similarly to Example 1, it became the composition shown in Table 1, and the polymeric resin composition 3 and the pattern 3 were obtained.

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Abstract

The invention provides a polymer resin composition, wherein, the composition contains alkali-soluble resin (A), polymer compound (B), initiator (C), initiation assistant (D) and solvent (E); the initiation assistant (D) is a compound containing the compound signified by at least one of formulas selected from a group composed of a formula (I-1) and a formula (I-2). In the formula (I-1) and the formula (I-2), ring X<1>, ring X <2> and ring X <3> are used for respectively and independently signifying an aromatic ring with 6-12 carbon atoms. Y <1>-Y <4> are used for respectively and independently signifying oxygen atoms or sulfur atoms. R <1>-R<4> are used for respectively and independently signifying alkyls with 1-12 carbon atoms or aryls with 6-12 carbon atoms. Methylene contained in the aromatic ring, the alkane and the aryl can also be replaced by oxygen atom, -NH- or sulfur atoms; hydrogen atoms contained in the aromatic ring, the alkane and the aryl can be replaced by halogen atoms.

Description

technical field [0001] The present invention relates to a polymeric resin composition. Background technique [0002] It is proposed to form a spacer (spacer) (optical spacer) between a color filter and an array substrate constituting a display device such as a liquid crystal display device or a touch panel, by using photolithography (photo-lithography) using a photosensitive resin. (photospacer)) method. According to this method, the spacer can be formed at any place. [0003] However, light emitted from a mercury lamp used as a light source for photolithography generally has a high-intensity spectrum around 436 nm, around 408 nm, around 365 nm, around 315 nm, around 313 nm, or the like. [0004] Most exposure machines used in the actual formation of optical spacers are proximity exposure machines or steppers. In recent years, proximity exposure machines often cut short-wavelength light less than 350 nm. And then use. In addition, in the step type, light having a wavelen...

Claims

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Application Information

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IPC IPC(8): C08F265/04C08F2/50G03F7/004G03F7/028
CPCC08F20/18C08F20/32C08G2650/24C08K5/33C08L33/068C08L33/14G02F1/133
Inventor 井上胜治武部和男
Owner SUMITOMO CHEM CO LTD
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