Synchronous control system for ultraprecise double-layer macro/micromotion platform

Abstract

The invention discloses a synchronous control system of ultra-sophisticated dual-layer macro and micro movement platform which includes a main control module set in a computer, two macro and micro movement platform control modules and a synchronous control module; two macro and micro movement platform control modules also include a micro movement platform control module, a follow control module, a macro platform control module, a laser measure module, and a grating measure module. The invention provides a micro movement platform position converter that can simplify the micro movement platform control; a force action converter that can increase follow precision of the macro movement platform. The control method using the macro movement platform to follow the micro movement platform can prevent the micro platform moving saturation, increase location precision of the macro and micro movement platform; the double-layer macro and micro movement platform synchronous controller can reduce synchronous error, and improve synchronous precision of the double-layer macro and micro movement platform. The synchronous control system can be used in a numerical control machine moving system, also can be used in other precious location system such as MEMS.

Description

technical field [0001] The invention belongs to the field of automation technology and advanced manufacturing technology, and specifically relates to a synchronous control system of an ultra-precise double-layer macro-micro motion platform, which can be applied to the motion system of a numerical control machine tool, and can also be applied to other ultra-precise positioning systems such as MEMS. Background technique [0002] With the continuous development of IC manufacturing and precision measurement, ultra-precision double-layer macro-micro motion platforms have been increasingly widely researched and applied. The ultra-precision double-layer macro-micro motion platform includes two macro-micro motion platforms. Each macro-micro motion platform is an ultra-precision large-stroke, high-precision positioning system. The two macro-micro motion platforms can be distributed up and down, or left and right. Distribution, two macro-micro motion platforms can respectively carry w...

AI Technical Summary

Problems solved by technology

Both methods have a common disadvantage: when the driven platform suffers from external interference and produces output changes, it cannot be fed back to the active system, causing the system to lose its proper ability to compensate for deviations.

The Chinese patent document with the publication number CN1967386A and the publication date of May 23, 2007 provides a "step-and-scan lithography machine wafer stage mask stage synchronous control system", wherein the mask stage is a macro-micro motion platform, The wafer table is not a macro-micro motion platform. This patent document introduces the macro-micro motion control of the mask table while introducing the synchronous control of the wafer table mask table. This invention uses a general master-slave control strategy to control the mask table ( As in the patent document Figure 5 As shown), the macro-moving platform in the mask stage is the active system, and the micro-moving platform is the driven system. The moving platform will also use the output value of the active system macro-moving platform as an input command to ensure the motion accuracy of the mask table; the disadvantage is that if the output changes of the driven system micro-moving platform suffers from external interference, the structure does not have any The function of feeding back the output of the micro-motion platform of the slave system to the macro-motion platform of the active system may cause the saturation of the micro-motion platform. The saturation of the micro-motion platform will not only cause the system to lose its proper deviation compensation ability, but may also cause the excitation system resonance, resulting in failure of the control

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