Image sensor and method for manufacturing the sensor
An image sensor and pattern technology, applied in semiconductor/solid-state device manufacturing, electrical solid-state devices, semiconductor devices, etc., to reduce noise and image delay
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[0015] The words "on" or "over" or "on" are used in the following description, those skilled in the art should understand that when referring to When a layer, region, pattern or structure is present, the layer, region, pattern or structure may be directly on another layer or structure, or intervening layers, regions, patterns or structures may also be present. When the words "under" or "beneath" are used in the following description, those skilled in the art will understand that when referring to a layer, region, pattern or structure, Such layers, regions, patterns or structures may be directly underlying other layers or structures, or intervening layers, regions, patterns or structures may also be present.
[0016] Figure 5 is a cross-sectional view showing an image sensor according to an embodiment of the present invention.
[0017] see Figure 5 , the image sensor includes: a gate 60 located on a semiconductor substrate 10; a first p-type doped region 50 and a second p-...
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