Immersion flow field stabilizing device used for photo-etching machine

Abstract

The invention discloses an immersion flow field stabilizing device for a photoetching machine. The immersion flow field stabilizing device is a device arranged between a projection lens group and a substrate, and consists of a pipeline connecting body, a main body structure and a self-adaptive slide block group. When high-speed motion of the substrate drives a liquid and causes a slit flow field to fluctuate, the self-adaptive slide block group can adjust position in real time to change sizes of flow passages of an inner isolation cavity, an outer isolation cavity, a filling cavity and a recovery cavity, thereby reducing impact strength; liquid of the inner isolation cavity and the outer isolation cavity can compensate fluctuation of the flow field in real time, automatically buffer and compensate the slit flow field, absorb liquid force impact formed by draw-off of the substrate, and inhibit and control unstability of the flow field; and sizes of the flow passages of the filling cavity and the recovery cavity can also be changed in real time in the process of high-speed motion of the substrate so as to maintain flow rate and stable pressure characteristic of the filling cavity and the recovery cavity, and maintain stability and reliability in the processes of filling and recovering under fluctuating impact of the slit flow field.

Description

technical field [0001] The invention relates to an immersion flow field stabilizing device in an immersion lithography (Immersion Lithography) system, in particular to an immersion flow field stabilizing device for a photolithography machine. Background technique [0002] Modern lithography equipment is based on optical lithography, which uses an optical system to accurately project and expose the pattern on the mask to the substrate (such as: silicon wafer) coated with photoresist. It includes an ultraviolet light source, an optical system, a projection mask composed of chip patterns, an alignment system and a substrate covered with photosensitive photoresist. [0003] The immersion lithography system fills a certain liquid in the gap between the projection lens and the substrate, and increases the numerical aperture (NA) of the projection lens by increasing the refractive index (n) of the medium in the gap, thereby improving the resolution of lithography rate and depth of...

AI Technical Summary

Problems solved by technology

At the same time, the leaked liquid may also make some parts of the lithography equipment not work properly, for example, the interferometer that monitors the position of the substrate

[0008] (2) Due to the fluctuation of the internal flow field formed by the pulling of the substrate, it will also form an impact on the liquid injection and recovery port, thereby changing the flow field and pressure characteristics of the liquid injection and recovery, and intensifying the coordination between the liquid injection and recovery. difficulty of control

And it will easily lead to insufficient liquid supply or the ineffective recovery of liquid. The former will easily cause the shrinkage of the flow field and cause the infiltration of air bubbles. The latter will increase the internal power to force the liquid to leak out of the APRB.

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