Double workpiece platform device
A technology of double workpiece table and workpiece table, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., and can solve the problems of mutual interference and affecting performance, etc.
Active Publication Date: 2011-06-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology
The force of the positioning units of the two workpiece tables during high-speed movement is achieved through the same balance mass to achieve vibration absorption and conservation of the center of mass. It is transmitted to the same balance mass, so that a crosstalk channel is formed between the two workpiece tables, which will inevitably lead to mutual interference between the two workpiece tables, which affects the performance of the two workpiece tables when they move
Method used
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Embodiment Construction
[0040] Specific embodiments of the present invention will be described below with reference to the accompanying drawings.
[0041] Such as figure 1 As shown, the double workpiece platform device according to the present invention includes a base platform 1, a workpiece platform 2 and a workpiece platform 5, a positioning unit 22 and a positioning unit 23, a balance mass system, a measurement system, and a control system. The base platform 1 is rigidly fixed on the base frame (not shown) of the photolithography machine. In addition, the base 1 is placed with a marble 16 , and the workpiece table 2 and the workpiece table 5 are floated on the marble 16 by air flotation. The marble 16 thus becomes a guide surface for the movement of the workpiece table. The control system measures the positioning of the two workpiece tables through the measuring system, so as to control the positioning of the two workpiece tables by controlling the two positioning units.
[0042] The balance ...
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Abstract
The invention provides a double workpiece platform device which comprises a base station, two workpiece platforms, two positioning units, a mass balancing system, a measuring system and a control system. The two positioning units are used for positioning the two workpiece platforms; the mass balancing system corresponds to the two workpiece platforms, is used for balancing the counterforce of thepositioning units in a mode of absorbing the counterforce of the positioning units and comprises two mass balancing units which respectively correspond to the two positioning units; and each mass balancing unit can absorb the counterforce of the positioning units and can reduce the vibration of a frame of a whole machine under the action of the counterforce. The two mass balancing units are not directly connected and respectively move relatively to a base frame so that mutual interference between the two workpiece platforms is reduced, and the motion precision of the two workpiece platforms is improved.
Description
technical field [0001] The invention relates to the field of semiconductor manufacturing equipment, in particular to a double work table device for a photolithography machine. Background technique [0002] The lithography machine is one of the important processing equipment in the manufacture of integrated circuit chips. It is used to expose and transfer the design pattern of the chip to the photoresist on the surface of the silicon wafer. As the main component of the lithography machine, the workpiece table system, its motion accuracy and speed greatly affect the production efficiency of the lithography machine. [0003] Early lithography machines usually used a single-workpiece stage, and alignment measurement and subsequent exposure in lithography were performed on the single-workpiece stage. A lithography machine with a single worktable can only lithography one silicon wafer at a time, and the silicon wafer can only be exposed after the alignment measurement is complete...
Claims
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IPC IPC(8): G03F7/20
Inventor 郑教增单世宝王天明马雨雷
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD