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Mask clamp

A mask and holder technology, applied in the field of semiconductor device manufacturing equipment, can solve problems such as expensive processes, and achieve the effect of preventing damage or scratching of the surface film and safe operation

Inactive Publication Date: 2010-01-13
SEMICON MFG INT (SHANGHAI) CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The process of producing and repairing reticles is very expensive

Method used

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Embodiment Construction

[0017] The present invention generally relates to the manufacturing process of integrated circuits and semiconductor devices. More specifically, the present invention provides an improved reticle holder to prevent the reticle from being damaged and scratched when the reticle is manually operated on the production line. By way of example only, the present invention has been applied to reticle holders for the manufacture of integrated circuits, but a wider range of applications should be realized.

[0018] It should also be understood that the examples and embodiments herein are only for illustrative purposes, and those skilled in the art will know various changes or changes under the enlightenment of the present invention, and these changes or changes are also included in the spirit and scope of the application and within the scope of the appended claims.

[0019] Exemplary embodiments of the present invention are fully described with reference to the accompanying drawings. Th...

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PUM

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Abstract

The invention discloses a device and a method for operating a mask in the technological process for manufacturing semiconductor devices on a production line. The device comprises a fixing frame which is used for fixing the mask and is configured to fix the mask safely, and a level indicator is connected with the fixing frame to indicate the level state of the fixing frame; and the device further comprises a shaft connected to the fixing frame for the convenience of fixing a switch connected to the shaft. The method comprises the following steps: providing the mask; using the mask fixing frame to clamp the mask, wherein the fixing frame comprises the switch and the level indicator, and the level indicator works together with the fixing frame and is used for indicating the level state of the fixing frame; and loading the mask into a mask box, and simultaneously using the level indicator to keep the fixing frame level.

Description

technical field [0001] The present invention relates to semiconductor device manufacturing equipment and methods, and more specifically, the present invention provides a reticle holder to prevent the reticle from being damaged and scratched when the reticle is manually operated on a production line. Background technique [0002] In lithography, a reticle or mask consists of a patterned opaque coating (Coating) on ​​a transparent substrate, such as chromium, and is used to manufacture integrated circuits for semiconductor devices or other Devices with tiny features formed on the substrate. A set of reticles each defining a patterned layer in integrated circuit fabrication is provided to a stepper or scanner and selectively exposed, respectively. In photolithography for mass production of integrated circuit devices, the photomask is also called a photoreticle or reticle. As used in stepper and scanning lithography machines, the reticle contains a layer of the die that is pro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F1/00H01L21/00
CPCG03F7/70741
Inventor 徐晓敏吴凌辉金志锐
Owner SEMICON MFG INT (SHANGHAI) CORP