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Microscopic repositioning method for nano material or micro-nano device

A nano-material, repetitive positioning technology, applied in the field of detection, can solve the problems of low positioning accuracy, easy pollution, damage to samples, etc., and achieve the effects of accurate positioning, low cost and simple operation.

Active Publication Date: 2011-02-02
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These methods have solved the repositioning problem of the scanning probe microscope sample to a certain extent, but there are many limitations in practical applications, such as the substrate is generally required to be a transparent material and the substrate cannot be reused, the positioning accuracy is not high, and marking on the sample Easy to contaminate and damage samples, etc.

Method used

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  • Microscopic repositioning method for nano material or micro-nano device
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  • Microscopic repositioning method for nano material or micro-nano device

Examples

Experimental program
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Effect test

Embodiment 1

[0034] In this embodiment, an optical microscope is used to achieve microscopic repeated positioning of samples of nanomaterials or micro-nano devices. The positioning steps are as follows:

[0035] 1) Drop or paste the sample onto the substrate;

[0036] 2) Fix the substrate on the sample stage of the optical microscope, and place the substrate parallel to one side of the sample stage;

[0037] 3) Then rotate the screw knob of the sample stage to move the position of the sample stage, so that the microscope lens is aligned with a certain position of the sample;

[0038] 4) Select the appropriate magnification to observe through the eyepiece and adjust the focal length, and use the equipped CCD camera to take images of the observed area;

[0039] 5) Move the substrate along any one of N, W, S and E directions by rotating the screw knob of the sample stage, for example, move along the N direction, so that the center of the lens is aligned with a minimum coordinate scale on th...

Embodiment 2

[0047] In this embodiment, the atomic force microscope is used to achieve microscopic repeated positioning of samples of nanomaterials or micro-nano devices. The positioning steps are as follows:

[0048] 1) Drop or paste the sample onto the substrate;

[0049] 2) Fix the substrate on the sample stage of the atomic force microscope, and place the substrate parallel to one side of the sample stage;

[0050] 3) Then move the substrate to the sample area to be observed;

[0051] 4) Insert the tip of the atomic force microscope into the needle, scan the observation area, and withdraw the needle after obtaining the image of the sample;

[0052] 5) Observe the coordinates with the help of the optical microscope equipped with the atomic force microscope, and then move the substrate along any of the N, W, S, E directions, for example, along the W direction, so that the center of the lens is aligned with a minimum coordinate scale on the coordinate line of the W direction ;

[0053...

Embodiment 3

[0063] In this embodiment, a scanning electron microscope is used to achieve microscopic repeated positioning of samples of nanomaterials or micro-nano devices. The positioning steps are as follows:

[0064] 1) Drop or paste the sample onto the substrate. In order to cooperate with the scanning electron microscope, the substrate used here should preferably have certain conductivity;

[0065] 2) Place the substrate parallel to the side of the sample stage. If the substrate cannot conduct electricity, use conductive tape or conductive silver paste to make the substrate contact the sample stage, and dry it under an infrared lamp or dry it naturally;

[0066] 3) Then send the sample stage into the sample chamber, and make the sample enter the observation area;

[0067] 4) Adjust the focal length and magnification, observe the sample morphology, or select a suitable area and a suitable magnification, and take an image of the observed area;

[0068] 5) Move the base along any of t...

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Abstract

The invention relates to a microscopic repositioning method for a nano material or a micro-nano device. Multiple coordinate marks with different precisions and different symbols are respectively etched on the edge of a substrate or the periphery of the micro-nano device by utilizing a photoetching or electron-beam etching technology, and an observation area of a sample or a device can be quickly and accurately recovered by recording coordinate values of the area in a certain direction and a distance between the area and a coordinate line or recording the coordinate values of the area in two directions so as to realize the repositioning of the sample and the reprocessing of the micro-nano device.

Description

technical field [0001] The invention relates to a detection method, in particular to a micro-repeated positioning method for nanometer materials or micro-nano devices. Background technique [0002] Micro-nano devices refer to a class of devices whose smallest structural unit is in the micron or nanometer scale. Micro-nano devices are widely used in optics, electronics, mechanics, biology, medicine and other fields. With the development of nanomaterials and nanotechnology, the morphology observation, property characterization and controllable manipulation of micro-nano devices can be realized at the nanoscale. Instruments that can characterize the morphology and various properties of nanomaterial samples include optical microscopes (metallographic microscopes, laser confocal microscopes, polarizing microscopes, and dark field microscopes, etc.), scanning probe microscopes (atomic force microscopes, scanning tunneling microscopes, and near-field microscopes). field scanning ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
Inventor 吴爱国曾乐勇
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI