Bicolor basal plate and method for preparing same
A color base and substrate technology, applied in special decorative structures, vacuum evaporation plating, coatings, etc., can solve the problems of increased cost, poor wear resistance, and cumbersome processes, and achieve lower manufacturing costs and better bonding. Good, simple preparation method
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[0017] A method for preparing a two-color substrate. The base material is treated with one of the treatment methods of chemical etching, stamping, and die-casting, so that the surface of the base material forms a raised area and a non-raised area. The base material in the protruding area is subjected to surface plating treatment to form a film layer on the base material. The protruding thickness of the protruding area of the substrate containing the film layer is different from that of the non-protruding area, so that the protruding area and the non-protruding area present different differences. color.
[0018] The chemical etching, stamping, and die-casting molding are common chemical etching, stamping, and die-casting moldings in the field, as long as they can form a protruding area and a non-protruding area with clear boundaries.
[0019] In the present invention, only common magnetron sputtering in the field is used as an example to illustrate the content of the present ...
Embodiment 1
[0033] The present invention is illustrated by using the stainless steel substrate B1 that has been chemically etched and cleaned to carry out intermediate frequency magnetron sputtering ion plating.
[0034] The thickness of the protruding area of the base material of the stainless steel substrate B1 protruding from the non-protruding area is 0.7 mm. The film layer is a two-layer film, a metal titanium layer and a titanium dioxide layer. The selected target material is a titanium target with a purity of 99.99%.
[0035] Put B1 into the vacuum furnace, close the furnace door, turn on the vacuum pump to evacuate to 3.0×10 -2 Pa, adjust the vacuum degree to 2.0 Pa by introducing argon gas, the bias voltage to 600 volts, and the duty cycle to 50%, to perform plasma bombardment cleaning and activation for 10 minutes.
[0036] Introduce the working gas argon to make the vacuum degree 3.5×10 -1 Pa, turn on the titanium target power supply, the power supply is 16kW, the bias vol...
Embodiment 2
[0041] The present invention is illustrated by using the etched and cleaned aluminum alloy substrate B2 for ion plating by intermediate frequency magnetron sputtering.
[0042] The protruding area of the aluminum alloy substrate B2 is 0.8 mm thicker than the non-protruding area. The film layer is a two-layer film, a metal titanium layer and a silicon dioxide layer. The selected target materials are titanium targets and silicon targets with a purity of 99.99%.
[0043] Put B2 into the vacuum furnace, close the furnace door, turn on the vacuum pump to evacuate to 3.0×10 -2 Pa, adjust the vacuum degree to 2.0 Pa by introducing argon gas, the bias voltage to 600 volts, and the duty cycle to 50%, to perform plasma bombardment cleaning and activation for 10 minutes.
[0044] Introduce the working gas argon to make the vacuum degree 3.2×10 -1 Pa, turn on the titanium target power supply, the power supply is 14kW, the bias voltage is 200V, the duty cycle is 50%, and the time is 7 m...
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