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Pattern correction method and pattern correction device

A pattern and correction fluid technology, which is applied in nonlinear optics, instruments, optics, etc., can solve the problems of larger size, correction fluid being pressed around defective pixels, and uneven thickness of correction fluid, so as to achieve uniform thickness Effect

Inactive Publication Date: 2010-06-16
NTN CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when the pressure of the injected gas is too high, the correction fluid may overflow around the white defect
[0010] In addition, with the recent increase in the size of LCD TVs, the pixel size of the color filter has increased, and the size of the defect has also increased.
When the application area of ​​the correction fluid increases, the unevenness of the thickness of the correction fluid may further increase. Depending on the shape of the correction fluid swelling, the correction fluid may be pressed against the defect when the gas is sprayed from above. Situation around the pixel

Method used

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Embodiment Construction

[0079] figure 1 It is a figure which shows the main part of the liquid crystal color filter substrate 1 which is the correction object of the pattern correction method which concerns on one embodiment of this invention, figure 2 is its partial sectional view. figure 1 and figure 2 Among them, the liquid crystal color filter substrate 1 includes a glass substrate 2 . A grid-shaped black matrix 3 is formed on the surface of the glass substrate 2 , and R pixels 4 , G pixels 5 , and B pixels 6 are formed at regular intervals in a plurality of regions surrounded by the black matrix 3 . The R pixel 4 , the G pixel 5 , and the B pixel 6 are composed of red, green, and blue colored layers, respectively. figure 1 and figure 2 A state in which a rectangular white defect 6 a locally exists in the B pixel 6 is shown in . The rectangular white defect 6 a is formed by irradiating a laser beam to a rectangular region including a white defect of an arbitrary shape or a foreign matter ...

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Abstract

The present invention provides a pattern correction method and a pattern correction device, which can prevent the correction fluid from overflow to the periphery of a defect part and can lead to uniform thickness of the correction fluid coated to the defect part. According to the pattern correction method of the invention, after correction ink (7) is coated to a white defect (6a) of a pixel (6) of a liquid crystal color filter substrate (1), for obtaining an uniform thickness of the correction ink (7), gas containing vapor of solvent (16) is sprayed for the correction ink (7) for reducing the viscosity of the correction ink (7). Therefore, the overflow of the correction ink (7) coated to the white defect (6a) to the peripheral part can be restrained.

Description

technical field [0001] The present invention relates to a pattern correction method and a pattern correction device, and more particularly to a pattern correction method and a pattern correction device for correcting a defect portion of a pattern formed on a substrate. Background technique [0002] A liquid crystal display, a plasma display, an EL display, etc. are known as a representative example of a flat panel display. These displays continue to pursue larger and higher-definition screens, and tend to increase the number of pixels. Therefore, the probability of defects occurring in pixels increases during the manufacturing process, and a technique for correcting defects generated in pixels is required in order to improve yield. [0003] For example, as a method of correcting a white defect caused by partial discoloration of a colored layer (pixel) of a liquid crystal color filter, after adhering a correction liquid (correction ink) to the tip of a coating needle, the ti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13
Inventor 清水茂夫
Owner NTN CORP
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