Mask plate and manufacturing method thereof
A manufacturing method and mask technology, applied in the fields of nonlinear optics, instruments, optics, etc., can solve the problems of high mask production cost and development cost, and achieve the effects of saving relevant time, reducing manufacturing cost, and improving production efficiency
Inactive Publication Date: 2010-07-07
BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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Problems solved by technology
[0004] The purpose of the present invention is to provide a mask plate and its manufacturing method, to overcome the defects of high production cost and development cost of the mask plate in the prior art
Method used
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[0031] figure 1 It is a structural schematic diagram of the mask plate of the present invention. Such as figure 1 As shown, the mask plate includes: a clean and transparent upper substrate 1; first transparent conductive lines 101 located on the upper substrate 1 and arranged in a first direction; a first transparent insulating film 102 located above the first transparent conductive lines 101 And cover the upper substrate 1; the lower substrate 2; the second transparent conductive cable 201, located on the lower substrate 2 and arranged in a second direction, the second direction is perpendicular to the first direction; the second transparent insulating film 202, located The second transparent conductive line 201 is above and covers the lower substrate 2 ; and the mask plate formed by opposing the upper substrate 1 and the lower substrate 2 is sandwiched with a liquid crystal 4 .
[0032] In the mask plate of this embodiment, a vertical electric field is formed by the first ...
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Abstract
The invention relates to a mask plate and a manufacturing method thereof. The mask plate comprises an upper base plate, a first transparent conductive bar wire, a first transparent insulating film, a lower base plate, a second transparent conductive bar wire and a second transparent insulating film, wherein the first transparent conductive bar wire is positioned on the upper base plate and arranged towards a first direction; the first transparent insulating film is positioned above the first transparent conductive bar wire and covers the upper base plate; the second transparent conductive bar wire is positioned on the lower base plate and arranged towards a second direction; the second direction is vertical to the first direction; the second transparent insulating film is positioned above the second transparent conductive bar wire and covers the lower base plate; and liquid crystal is clamped between the upper base plate and the lower base plate. In the mask plate, a vertical electric field and a transmission region and a non-transmission region are formed through the first and second conductive bar wires so as to overcome the defect that a plurality of mask plates are needed in the conventional manufacturing process.
Description
technical field [0001] The invention relates to a mask plate and a manufacturing method thereof. Background technique [0002] Microelectronics technology is a new technology developed along with integrated circuits, especially VLSIs. Microelectronics technology includes a series of specialized technologies such as system circuit design, thin film patterning method, material preparation, automatic testing, packaging and assembly. With the development of microelectronics technology, its application field has gradually expanded to the manufacturing process of other precision equipment, such as liquid crystal display devices. [0003] The thin film patterning method is usually applied in the manufacturing process of the liquid crystal display (Liquid Crystal Display, referred to as LCD) panel, and the mask plate (mask) is an important material in the manufacturing process of the liquid crystal display panel. The process of manufacturing an array substrate or a color filter su...
Claims
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Login to View More IPC IPC(8): G02F1/13G02F1/1333
Inventor 周伟峰郭建明星
Owner BEIJING BOE OPTOELECTRONCIS TECH CO LTD