Double-workpiece-table system of lithography machine

Abstract

The invention provides a double-workpiece-table system of a lithography machine, which comprises a guide surface, a first silicon wafer table, a second silicon wafer table and a replacement system. The guide surface is arranged along the direction parallel to the X direction; the first silicon wafer table and the second silicon wafer table move from a first position to a second position along the directions parallel to the X direction and the Y direction; the replacement system is arranged to move along the guide surface and comprises a first replacement unit and a second replacement unit arranged along the directions parallel to the Y direction, the first silicon wafer table and the second silicon wafer table are respectively arranged on the first replacement unit and the second replacement unit and can move along the directions parallel to the Y direction respectively on the first replacement unit and the second replacement unit, and the first replacement unit and the second replacement unit are butted with each other so that the positions of the first silicon wafer table and the second silicon wafer table can be changed. Therefore, the double-workpiece-table system saves the time for exchange of the positions of double silicon wafer tables of the prior art, thereby improving the yield of the lithography machine.

Description

technical field [0001] The present invention relates to a lithography machine, and in particular to a system with a double work table in the lithography machine. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is a photolithography machine (exposure machine ). The resolution and exposure efficiency of the lithography machine determine the resolution and exposure efficiency of the lithography machine to a large extent. [0003] The basic principle of step and scan projection lithography machine is as follows: figure 1 shown. The deep ultraviolet light from the light source 10 passes through the mask plate 20 and the lens system 30 to image a part of the pattern on the mask plate on a certain chip of the silicon wafer 40 . The mask pla...

AI Technical Summary

Problems solved by technology

However, the above-mentioned switching operation has nothing to do with the photolithography process, which produces a considerable amount of time consumption and affects the yield.

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