Photosensitive composite dielectric gate MOSFET (Metal-Oxide-Semiconductor Field Effect Transistor) detector
A composite medium and detector technology, which is used in the manufacture of electric solid state devices, semiconductor devices, and semiconductor/solid state devices, etc., can solve the problems of extremely high process control requirements, high production costs, and difficulty in improving the effective quantum efficiency.
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[0055] The working mechanism and process of the optoelectronic storage layer are as follows:
[0056] 1) Photoelectron collection and signal collection:
[0057] figure 1 , 2 Middle energy band diagram and photoelectron generation and migration diagram: Photoelectron generation in the figure 1. When hv>semiconductor Eg (or Eg+ΔEc), the photon is absorbed by the semiconductor, and an electron will be excited from the valence band to the conduction band;
[0058] 2. Photoelectron migration: When the voltage difference between the gate and the substrate is positive, photoelectrons migrate to the interface between the underlying medium and the semiconductor; when the voltage difference between the gate and the substrate is positive, if the photon hv>semiconductor Eg+semiconductor and the bottom layer The ΔEc of the medium, the excited photoelectrons will directly enter the photoelectron storage layer, migrate to the interface between the underlying medium and the semiconductor,...
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