Method for preparing super-hard, high efficacy heat conduction and low-absorption AlxSiyN film by double-target radio frequency magnetron co-sputtering

Abstract

The invention discloses a method for preparing a super-hard, high efficacy heat conduction and low-absorption AlxSiyN film by double-target radio frequency magnetron co-sputtering, which belongs to the technical field of thin films. The known thin films of the same type in the field have the defects of low hardness, poor heat conductivity and high light absorption and are limited to be applied in related fields. The method for preparing the super-hard, high efficacy heat conduction and low-absorption AlxSiyN film by the double-target radio frequency magnetron co-sputtering comprises the following steps of: co-sputtering a silicon target and an aluminum target in a proper proportion of nitrogen gas to argon gas under the condition with certain sputtering power ratio between the double targets to form the AlxSiyN film by using a principle of the double-target radio frequency magnetron co-sputtering; and adjusting the gas proportion, the sputtering chamber pressure and the power ratio between the double targets to realize a proper proportion of x to y so as to prepare the super-hard and high efficacy heat conduction antireflection film. The method is of great significance to the promotion of the development in related fields.

Description

A method for double-target radio frequency magnetron co-sputtering of superhard, high-efficiency thermal conductivity, and low-absorption AlxSiyN film technical field The invention relates to the technical fields of optoelectronic materials and thin films. Background technique Traditionally known in this field, the shortcomings of similar films are low hardness, poor thermal conductivity, and large light absorption, which limit the application in related fields. A double-target RF magnetron co-sputtering method for superhard, high-efficiency thermal conductivity, and low-absorption films is to introduce a dual-target co-sputtering mode on the basis of the traditional magnetron sputtering method for magnetron sputtering thin films. A thin film with high hardness, good thermal conductivity and small absorption is deposited on it. Aiming at the shortcomings of traditional thin films, the present invention proposes a double-target radio-frequency magnetron co-sputtering meth...

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Problems solved by technology

Traditionally known in this field, the shortcomings of similar films are low hardness, poor thermal ...

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