Manufacturing method of phase-changing random access memory
A technology for accessing memory and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc. It can solve the problems of device quality degradation, dielectric layer and polysilicon column loss, etc., and achieve the effect of overcoming short circuit
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[0028] In one embodiment of the present invention, a method for manufacturing a phase change random access memory is provided, such as figure 2 shown, including steps:
[0029] S11, providing a semiconductor substrate, the semiconductor substrate has a memory area, a decoder area and a peripheral circuit area, the memory area, the decoder area and the peripheral circuit area are covered by a dielectric layer, and the dielectric layer has a plurality of polysilicon a plug, the polysilicon plug is respectively connected to the memory area, the decoding area and the peripheral circuit area;
[0030] S12, etching the polysilicon plug to form plug holes on the dielectric layer;
[0031] S13, performing ion implantation on the polysilicon plug to form a vertical diode;
[0032] S14, filling the sacrificial dielectric layer on the vertical diode;
[0033] S15, removing the sacrificial dielectric layer filled on the vertical diodes in the decoder area and the peripheral circuit ar...
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Abstract
Description
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Application Information
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