4results about How to "Does not affect electrical performance" patented technology

The present application relates to cable winding technical field, specifically to a kind of computer cable production with bunching line bunching winding machine and winding method, including bunching line winding mechanism and winding film cutting mechanism, winding film cutting mechanism includes cutting positioning table, cutting execution seat, cutting barrier, cutting execution part and drive part, cutting positioning table is fixedly arranged in the side of bunching line winding mechanism.The present application is integrated bunching line winding mechanism and winding film cutting mechanism, cutting execution seat and cutting execution part are driven along cutting positioning table sliding by drive part, cooperate with the heating and rolling action of ironing wheel, realize the synchronous completion of fusing cutting and end welding of winding film, effectively solve the problem that film end is loose after cutting of traditional winding machine.

This utility model relates to a connector and an electronic device. The connector includes a plug and a socket. The plug includes a plug shell and a first spacer, the first spacer being disposed within the plug shell. The socket includes a socket shell and a second spacer, the second spacer being disposed within the socket shell. The plug shell and the socket shell are inserted into each other. The first and second spacers are arranged along the insertion and removal direction of the plug, and at least a portion of the first spacer abuts against the second spacer along its thickness direction. At least one of the first and second spacers is provided with a pressure relief hole. The connector of this utility model is easy to insert and remove, and has a good feel during use.

The invention discloses a preparation method of a blue light absorbing material layer of a blue light absorbing photoresist, and relates to the technical field of photoresists, and the preparation method comprises the following steps: preparing a mixed matrix, adding a polyether siloxane copolymer, tetrakis [beta-(3, 5-di-tert-butyl-4-hydroxyphenyl) propionic acid] pentaerythritol ester, a modified mica sheet and a blue light absorbent into a resin solution, stirring, and carrying out vacuum drying to obtain the blue light absorbing material layer of the blue light absorbing photoresist. Dispersing, adding 2, 4, 6-triamino-1, 3, 5-triazine, stirring, filtering and curing; the blue light absorbent is added, a beta-diketone group in the molecular structure of the blue light absorbent can specifically absorb blue light in the wave band of 400-500 nm, the light absorption efficiency is high, almost no absorption is generated on ultraviolet light and long-wave visible light, the blue light can be accurately blocked, meanwhile, the photoetching exposure process is not disturbed, the blue light absorbent and zinc ions of the modified mica sheet can also form coordinate bonds, and the blue light absorbent can be used for absorbing blue light in the wave band of 400-500 nm. The coating is stably attached to the surface of mica, light absorption performance reduction caused by self-molecule agglomeration is avoided, and it is ensured that the blue light absorption effect of the film is uniform and lasting.

The invention relates to the technical field of industrial visual inspection, in particular to a metallized film defect detection method and device, computer equipment and a program product. The metalized film defect detection method comprises the following steps: acquiring a transmitted light image of a metalized film to be detected; obtaining a sheet resistance distribution field of the metallized film through a photoelectric mapping relation according to light intensity distribution in the transmitted light image; virtual voltage is applied, the square resistance distribution field serves as a coefficient field, and a steady-state current continuity equation is solved to obtain a potential distribution field; a power density field is calculated according to the potential gradient of the potential distribution field and the square resistance distribution field, and the power density field represents the energy concentration degree caused by current crowding; and identifying defects in the metallized film based on the power density field and the transmitted light image. The accuracy of detecting the defects of the metallized film can be improved.