Method for removal of ClO3F
A technology of reducing agent and aqueous solution, applied in separation methods, chemical instruments and methods, inorganic chemistry, etc., can solve problems such as no reported ClO3F removal method.
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Embodiment 1
[0046] In the packed column 5 made of vinyl chloride with a length of 1700 cm and an inner diameter of 50 mm, Raschig rings made of SUS with a length of 1700 cm and an inner diameter of 50 mm are filled with Raschig rings made of SUS, and Na 2 S 2 o 4 Concentration is that 1.5mol / l, KOH concentration are the aqueous solution of 0.15mol / l as in the wet-type decontamination device 3 of reaction liquid 6, import with mass flow controller 2 to contain 1410volppmClO with 274Nml / min 3 F of N 2 as ClO 3FRemove the gas of the processing object. Then, the gas released from the wet detoxification device 3 is collected in the empty container 7 .
[0047] The ClO in the gas collected in the empty container 7 was analyzed by FT-IR (IG-1000 manufactured by Otsuka Electronics Co., Ltd.). 3 F concentrations were analyzed. As a result, N 2 ClO in 3 F is lower than the detection limit of 0.5 volppm, thus confirming that ClO can be removed 3 F.
Embodiment 2
[0049] as ClO 3 F to remove the gas of the treatment object, use the gas containing 2280volppmClO 3 F CH 4 , except that, carried out under the same conditions as in Example 1. Same as Example 1, use FT-IR (IG-1000 produced by Otsuka Electronics Co., Ltd.) to analyze the ClO in the gas collected after the wet detoxification device 3 3 F concentrations were analyzed.
[0050] As a result, ClO 3 The F concentration was lower than the detection limit of 0.5 volppm, thus confirming the ability to remove CH 4 ClO in 3 F.
Embodiment 3
[0052] as ClO 3 F to remove the gas of the treatment object, use the gas containing 2280volppmClO 3 F's NF 3 , except that, carried out under the same conditions as in Example 1. Same as Example 1, use FT-IR (IG 1000 manufactured by Otsuka Electronics Co., Ltd.) to analyze the ClO in the gas collected after passing through the wet detoxification device 3 3 F concentrations were analyzed.
[0053] As a result, ClO 3 The concentration of F was lower than the lower detection limit of 0.5 volppm, thus confirming the ability to remove NF 3 ClO in 3 F.
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