System and method for performing single-side continuous chemical wet treatment by using mist chemical agent

Abstract

The invention relates to a system and a method for performing single-side continuous chemical wet treatment by using atomized chemical agent. The system comprises an atomizer capable of generating atomized chemical agent by using heated gas chemical agent and liquid chemical agent, a plurality of chemical wet treatment cavity units, a plurality of deionized water spraying wet treatment cavity units, an isopropanol (IPA) drying treatment cavity unit and a transmission mechanism which delivers the materials to be treated into the processing unit cavities in turn; and the system also comprises a spraying knife which is provided with a plurality of atomized chemical agent spraying nozzles; a capillary is arranged in the middle of each spraying nozzle; and the atomized chemical agent is sprayed onto the surface of the material to be treated in sector shape through the spraying nozzle space around the capillaries. The system and the method make the single-side continuous chemical wet treatment simple and feasible, effectively solve the problem of cross contamination caused by the repeated use of chemical liquid of the traditional fixed chemical process tank, enhance the flat substrate and improve the uniformity, flexibility and yield of the chemical process treatment of the thin film substrate of the material to be treated.

Description

technical field [0001] The present invention relates to a system and method for chemically treating solar cell / flat panel display substrates or thin film substrates, especially for large-scale single-sided continuous chemical wet treatment of substrates or thin film substrates with foggy chemical agents systems and methods. Background technique [0002] Chemical wet treatment is an essential and extremely important process step and technology in the production of substrates such as solar cells and new display screens. It is not only used to remove substrate surface damage and metal and non-metallic pollutants caused by previous processing procedures, but also to form an optimal substrate process surface state for the next process (such as solar cell substrates) Plush and phosphoric acid glass (PSG) cleaning process, which directly determines the photovoltaic conversion efficiency and its service life). Likewise, this wet process occupies more than 25%-30% of the entire sol...

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Problems solved by technology

But such a process only removes specific types of pollutants or substances, but leaves some alternative substances particles and metal pollutants from its dry process

Due to the more active ultraviolet rays used in these methods, the damage to the substrate surface caused by the activity of the plasma is accelerated.

And the dry treatment method does not have the effect of the wet treatment method to remove specific material particles during the cleaning process, because it cannot use specific formulated chemical wet treatment synthetic agents, because these synthetic agents cannot be used in their vapor or gas. Existence (e.g. NaOH+IPA+H 2 O)

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