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Alkali-soluble hyperbranched photosensitive organic silicon prepolymer and preparation method thereof

An organosilicon, alkali-soluble technology, applied in the field of photosensitive organosilicon prepolymer and its preparation, alkali-soluble hyperbranched photosensitive organosilicon prepolymer

Inactive Publication Date: 2011-02-02
BEIJING UNIV OF CHEM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The technical problem to be solved by the present invention is to prepare an alkali-soluble hyperbranched photosensitive organosilicon prepolymer that can be developed with a dilute alkali aqueous solution, and improve the high temperature resistance and flexibility of the prepolymer by inserting organic silicon segments; Add carboxyl groups to improve the environmental pollution caused by organic developer, and meet the needs of production and life

Method used

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  • Alkali-soluble hyperbranched photosensitive organic silicon prepolymer and preparation method thereof
  • Alkali-soluble hyperbranched photosensitive organic silicon prepolymer and preparation method thereof
  • Alkali-soluble hyperbranched photosensitive organic silicon prepolymer and preparation method thereof

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Embodiment 1

[0138] The synthesis of N,N-dihydroxyethyl-3-aminopropionic acid methyl ester monomer, the methyl acrylate 28.38g that adds the amount of equal substance and diethanolamine 34.65g in the four-neck flask that condenser tube and mechanical stirring are housed, 20 g methanol was used as solvent. mixture at room temperature and pass N 2 After stirring for 30 minutes under certain conditions, the temperature was raised to 40°C for 4 hours, and then distilled under reduced pressure to remove methanol to obtain a colorless and transparent N, N-dihydroxyethyl-3-aminopropionic acid methyl ester monomer. The reaction formula is as follows:

[0139]

Embodiment 2

[0141] Hexafunctional hydroxyl-terminated hyperbranched polyamine-ester (HBP 1 -OH) synthesis, add trimethylolpropane 1.34g, 3 times the molar amount of N,N-dihydroxyethyl-3-aminopropane in the four-necked flask connected with water separator, addition funnel and mechanical stirring 5.73 g of methyl ester and 0.07 g of p-toluenesulfonic acid. The mixture was heated to 120 ° C for 3 h to obtain a light yellow oily six-functional hydroxyl-terminated hyperbranched polyamine-ester (HBP 1 -OH), the equation is as follows:

[0142]

Embodiment 3

[0144] Twelve-functional hydroxyl-terminated hyperbranched polyamine-ester (HBP 2 -OH) synthesis, add trimethylolpropane 1.34g, 3 times the molar amount of N,N-dihydroxyethyl-3-aminopropane in the four-necked flask connected with water separator, addition funnel and mechanical stirring 5.73 g of methyl ester and 0.07 g of p-toluenesulfonic acid. The mixture was heated to 120°C for 3 hours, then, 11.46 g of N,N-dihydroxyethyl-3-aminopropionic acid methyl ester was added dropwise with 6 times the molar amount, and the temperature was raised to 130°C for 3 hours to obtain light yellow oily Twelve-functional hydroxyl-terminated hyperbranched polyamine-ester (HBP 2 -OH), the reaction formula is as follows:

[0145]

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Abstract

The invention discloses alkali-soluble hyperbranched photosensitive organic silicon prepolymer and a preparation method thereof. The preparation method comprises the following steps of: (1) adding organic silicon, polyisocyanate, carboxylic acid or anhydride containing an active group and a catalyst to a first reactor and reacting for 3-7 hours at the temperature of 50-60 DEG C; (2) adding a hydroxyl-ended hyperbranched polymer (HPB-OH) and a catalyst to a second reactor, then, adding a product in the first step, and reacting for 2-5 hours at the temperature of 30-70 DEG C; (3) adding the polyisocyanate, a gadoleic acid-hydroxyl ester compound, the catalyst and a polymerization inhibitor to a third reactor, and reacting for 5-8 hours at the temperature of 40-80 DEG C; (4) reacting the product in the second step, the product in the third step, the catalyst and the polymerization inhibitor for 2-6 hours at 30-80 DEG C; and (5) cooling to room temperature, discharging and keeping in a dark place for standby. The invention has the advantages that: (1) the synthesized alkali-soluble hyperbranched photosensitive organic silicon prepolymer has better high temperature resistance, better photosensitivity, better flexibility, higher light reaction activity and lower viscosity; (2) solder resist ink prepared by the prepolymer is developed by a diluted alkali solution, therefore, the environmental pollution caused by largely using an organic solvent is avoided; and (3) the synthetic method is simple and is easy to operate, and raw materials are cheap and are easy to obtain.

Description

technical field [0001] The invention relates to a photosensitive organic silicon prepolymer and a preparation method thereof, in particular to preparing an alkali-soluble hyperbranched photosensitive organic silicon prepolymer and measuring its performance. It belongs to the field of fine chemical technology. Background technique [0002] Solder resist ink is one of the key materials for making printed circuit boards (Printed Circuit Board, PCB). It is coated on etched circuit boards and cured to form excellent protection such as insulation, heat resistance, and adhesion. Membrane to prevent line disconnection. In the immersion tin process, the tinned area can be controlled to prevent short circuits caused by dense solder joints. The alignment accuracy and resolution of traditional screen printing solder resist ink are poor. The adhesion between dry film solder resist ink and circuit board is not good. Since the concept of alkaline water developing photoimaging solder res...

Claims

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Application Information

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IPC IPC(8): C08G18/81C08G63/685C08G18/61C09D11/10C08G18/46C09D11/102
Inventor 孙芳刘晓康
Owner BEIJING UNIV OF CHEM TECH
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