Copper-containing waste etching solution treatment method and etching solution regeneration method

Abstract

The invention provides a copper-containing waste etching solution treatment method. In the electrodialysis step, copper ions and ammonium ions contained in the copper-containing waste etching solution are removed for obtaining treatment solution with low copper content. The concentration of the copper ions in the treatment solution with the low copper content is not more than 1ppm. In the reduction step, the removed copper ions are reduced for producing copper, copper oxide and/or cuprous oxide, and the removed ammonium ions are reduced for producing ammonia gas. The invention further relates to an etching solution regeneration method.

Description

technical field [0001] The invention relates to a treatment method of etching waste liquid and a regeneration method of etching solution, and in particular to a treatment method of copper-containing etching waste liquid and a regeneration method of copper-containing etching solution. Background technique [0002] In the process of preparing liquid crystal display panels and printed circuit boards, it is often necessary to use various etching solutions to etch metal materials. Metal ions generated during the etching process will continuously accumulate in the etching solution. When the concentration of metal ions in the etching solution rises to a certain level, the etching solution will become unusable and become an etching waste. These etching waste liquids contain a large amount of metal ions, acidic or alkaline etchant, and other chemical substances, so they cannot be disposed of at will, and must be discharged after specific waste liquid treatment. [0003] In this fiel...

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Problems solved by technology

However, the sulfuric acid conversion evaporation method must add a large amount of sulfuric acid, and the hydrogen peroxide and chemical etchant in the waste liquid

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