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Copper-containing waste etching solution treatment method and etching solution regeneration method

A treatment method and a waste liquid treatment technology, which are applied to the improvement of process efficiency, photographic technology, instruments, etc., can solve the problems of inability to recycle hydrogen peroxide and chemical etchant, and the inability to effectively recycle chemical etchant

Inactive Publication Date: 2011-04-06
KISMART
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, the sulfuric acid conversion evaporation method must add a large amount of sulfuric acid, and the hydrogen peroxide and chemical etchant in the waste liquid cannot be recovered
Electrolysis can be used to recover copper metal, but this treatment cannot effectively recover the chemical etchant in the etching waste liquid

Method used

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  • Copper-containing waste etching solution treatment method and etching solution regeneration method
  • Copper-containing waste etching solution treatment method and etching solution regeneration method

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Embodiment Construction

[0051] Embodiments and specific examples of the present invention are described below with reference to the accompanying drawings, in which like reference numerals refer to like parts throughout.

[0052] In various embodiments of the present invention, a treatment method for copper-containing etching waste liquid is proposed. Generally speaking, the waste copper-containing etching solution contains at least copper ions, ammonium ions, hydrogen peroxide and other chemical substances contained in the original etching solution. The treatment method proposed by the present invention can not only obtain copper with economic value, but also various products produced in the reaction process also have the value of recycling and reuse. In addition, the above treatment method can better retain most of the chemical composition of the original etching solution in the waste etching solution, so that it can be recycled and used to avoid unnecessary waste.

[0053] One embodiment of the pr...

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Abstract

The invention provides a copper-containing waste etching solution treatment method. In the electrodialysis step, copper ions and ammonium ions contained in the copper-containing waste etching solution are removed for obtaining treatment solution with low copper content. The concentration of the copper ions in the treatment solution with the low copper content is not more than 1ppm. In the reduction step, the removed copper ions are reduced for producing copper, copper oxide and / or cuprous oxide, and the removed ammonium ions are reduced for producing ammonia gas. The invention further relates to an etching solution regeneration method.

Description

technical field [0001] The invention relates to a treatment method of etching waste liquid and a regeneration method of etching solution, and in particular to a treatment method of copper-containing etching waste liquid and a regeneration method of copper-containing etching solution. Background technique [0002] In the process of preparing liquid crystal display panels and printed circuit boards, it is often necessary to use various etching solutions to etch metal materials. Metal ions generated during the etching process will continuously accumulate in the etching solution. When the concentration of metal ions in the etching solution rises to a certain level, the etching solution will become unusable and become an etching waste. These etching waste liquids contain a large amount of metal ions, acidic or alkaline etchant, and other chemical substances, so they cannot be disposed of at will, and must be discharged after specific waste liquid treatment. [0003] In this fiel...

Claims

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Application Information

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IPC IPC(8): C25C1/12C23F1/46
CPCY02P10/20
Inventor 杨为梁
Owner KISMART
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