Laser cleaning equipment and method for sol-gel membrane surface

Abstract

The invention relates to laser cleaning equipment and a laser cleaning method for a sol-gel membrane surface and belongs to the technical field of optical materials and laser. The cleaning equipment comprises a pulse laser, a chopping board, a lens, a two-dimensional movement platform, a collimation laser, an energy meter, a stepping motor and a computer; a sample is arranged at the two-dimensional movement platform with micron resolution, the computer is connected with the pulse laser and the stepping motor respectively through a cable and controls the pulse laser and the stepping motor, and the stepping motor controls the two-dimensional movement platform; pulse laser emitted by the pulse laser is divided into two beams, namely probe light and main laser after passing through the chapping board; the probe light enters the energy meter; and the main laser reaches the two-dimensional movement platform after being focused through the lens; and collimation light generated by the collimation laser reaches the chopping board and is superposed with the main laser, and the position of the main laser is judged through the collimation light. The equipment has the advantages of avoiding secondary pollution, prolonging service life of coating film elements, not leaving a dead angle and damaging the membrane surface, along with high cleaning efficiency and the like.

Description

technical field [0001] The invention relates to a laser cleaning device and a cleaning method thereof, belonging to the technical field of optical materials and lasers, in particular to a laser cleaning device and a cleaning method of a sol-gel film surface. Background technique [0002] In large high-power laser systems, quartz materials (main components: SiO 2 ) are widely used in lenses, windows and shielding sheets, etc. During the operation of strong lasers, the splashing of quartz particles caused by damage to certain components can easily contaminate other undamaged components. Sol-gel chemical films (such as SiO 2 Single-layer anti-reflection coating, etc.) are widely used in high-power laser systems due to their low cost, excellent anti-laser damage performance, simple coating process, and suitable for coating large-diameter components. However, the chemical membrane has a loose and porous structure, and the nanoscale pores are covered with abundant dangling bonds...

AI Technical Summary

Problems solved by technology

Therefore, the pollution of quartz dust particles on the membrane surface will be unavoidable. On the one hand, the existence of these particles will cause the beam quality of the subsequent optical path to decrease due to effects such as scattering and reflection; on the other hand, it will cause low threshold damage to components.

[0003] Traditional cleaning techniques include mechanical cleaning, chemical wet cleaning, ultrasonic cleaning, etc., which are often powerless to clean micron and submicron pollutants

In addition, the method of mechanical wiping is likely to cause scratches on the membrane surface; organic spraying, showering, soaking, etc. are likely to cause peeling off of the membrane surface or secondary pollution, and are likely to cause harm to the operator's body; ultrasonic cleaning will Potential damage to both film and component

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