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Method for producing a metal oxide layer with a predetermined structure by arc evaporation

An oxide, metal technology, applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve problems such as spark discharge interruption

Active Publication Date: 2017-03-15
OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Depending on the design of the power supply (magnetic field, location and type of gas inlet), this can cause the conductive region on the target (cathode) where the spark runs to shrink itself and eventually lead to an interruption of the spark discharge

Method used

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  • Method for producing a metal oxide layer with a predetermined structure by arc evaporation
  • Method for producing a metal oxide layer with a predetermined structure by arc evaporation
  • Method for producing a metal oxide layer with a predetermined structure by arc evaporation

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Embodiment Construction

[0038]According to the invention, the structure of the oxide to be deposited can be read out on the basis of the phase diagram of the metal or semimetal components used to synthesize the oxide. This means that eg for ternary Al-Cr-O, reference is made to the Al-Cr binary phase diagram. For quaternary oxides, reference is made accordingly to the ternary phase diagram of the metal or semimetal forming the oxide. The target for arc evaporation is then formed from a metal or semimetal which is the metal or semimetal used to form the oxide of the corresponding structure to be formed. The composition of the target is selected such that the temperature of the transition to the liquid phase according to the phase diagram satisfies the formation temperature condition of an oxide having a desired structure. Oxide formation is then achieved by the reaction of the evaporated target or the target to be evaporated with oxygen.

[0039] This means that in order to produce a certain desired...

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Abstract

In a cathode spark physical vapour deposition process, the vapour deposit is directed at a metal powder target consisting of two metal or semi-metal components. The components are selected such that the solid phase boundary is not passed on reaching the liquid phase, as compared with the phase diagram of a molten mixture of the two components.

Description

technical field [0001] The invention relates to a method for producing a metal oxide layer with a predetermined structure by arc evaporation according to the preamble of claim 1 . [0002] The invention relates in particular to the fabrication, selection and operation of so-called "alloy targets", ie targets consisting of at least two metallic and / or semi-metallic components serving as evaporation sources in cathodic arc evaporation. [0003] The invention is especially important for "alloy targets" composed of metals with widely differing melting temperatures. [0004] These alloy targets are defined as having at least two metallic components, but these metallic components may also be present as intermetallic compounds and / or mixed crystals. Background technique [0005] Powder metallurgy targets in this context are microscopes that are made of powders of metals, semi-metals, intermetallics, mixed crystals, and where powder particles can still be discerned after this manuf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32C23C14/34C23C14/08
CPCB22F2998/00C22C1/0416C23C14/0036C23C14/08C23C14/081C23C14/083C23C14/325C23C14/3414Y10T428/12028B22F3/15
Inventor J·拉姆
Owner OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
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