Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for preparing porous hierarchical structure semiconductor photocatalytic material

A photocatalytic material, hierarchical structure technology, applied in chemical instruments and methods, physical/chemical process catalysts, metal/metal oxide/metal hydroxide catalysts, etc., can solve the problem of increasing the difficulty and complexity of the catalyst preparation process, Due to the narrow scope of light energy utilization and other problems, the effect of low cost, convenient material acquisition and simple process is achieved.

Inactive Publication Date: 2011-06-15
SHANGHAI JIAO TONG UNIV
View PDF2 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In recent years, the research on oxide semiconductor materials as photocatalysts has been very active. In practical applications, it has also been found that most catalyst materials have a narrow range of light energy utilization, and selective surface treatment such as doping modification or Organic and inorganic compounding is carried out to enhance its activity, which increases the difficulty and complexity of the catalyst preparation process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing porous hierarchical structure semiconductor photocatalytic material
  • Method for preparing porous hierarchical structure semiconductor photocatalytic material
  • Method for preparing porous hierarchical structure semiconductor photocatalytic material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

Embodiment 2

Embodiment 3

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Concentrationaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for preparing a porous hierarchical structure semiconductor photocatalytic material in the technical field of catalysts. The method comprises the following steps of: impregnating rape pollen in precursor solution of ferric nitrate, and performing oxidative firing treatment to obtain a ferric oxide material. The method is simple and flexible in process and low in cost; by effectively controlling the grain size and porous hierarchical structure of the ferric oxide, the photocatalyst material with good performance is obtained; and the prepared photocatalyst material with the porous hierarchical structure can catalytically decompose organic pollutants in the sun.

Description

Preparation method of semiconductor photocatalytic material with porous hierarchical structure technical field The invention relates to a method in the technical field of photocatalysts, in particular to a method for preparing a semiconductor photocatalytic material with a porous hierarchical structure. Background technique With the continuous discharge of industrial wastewater such as dye synthesis, printing and dyeing and the continuous use of various dyes, the number and types of dyes entering the environment are increasing, and the environmental pollution caused by dyes is becoming more and more serious. According to reports, about 60,000 tons of dyes are discharged into the environment in the form of waste every year in the world, especially the sewage containing organic dyes, which has had a huge impact on aquatic ecosystems and their boundary environments, and its poisoning incidents are increasingly occurring. Organic dyes are a large class of chemicals with stabl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B01J23/745B01J35/10A62D3/10
Inventor 苏慧兰朱亚琪陈建军张荻
Owner SHANGHAI JIAO TONG UNIV
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More