Uniform adjustable powder feeding device
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- CENT SOUTH UNIV
- Publication Date
- 2012-07-04
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a uniform and adjustable powder feeding device. Background technique
[0002] In chemical vapor deposition, laser cladding and plasma spraying, etc., the problem of quantitative and uniform powder transportation is involved, and the quality and uniformity of the control are directly related to the success of the process and the quality of the coating performance. For example, in the chemical vapor deposition process, there are many raw materials that are solid at room temperature (such as ZrCl 4 , HfCl 4 , TaCl 5 , ZrF 4 , YBr 3 etc.), there are two ways to feed the raw materials into the reaction furnace, one is to introduce the raw materials into the furnace after being heated and gasified, which has a low utilization rate of the raw materials and is easy to block the pipeline; the other is to directly send the raw material powder in the form of solid This method can overcome the above shortcomings, but it needs to sol...