Catalyst for preparing acetaldehyde and ethylene by ethane selective oxidation and preparation method thereof
A selective oxidation and catalyst technology, applied in chemical instruments and methods, oxidation preparation of carbonyl compounds, metal/metal oxide/metal hydroxide catalysts, etc., can solve low conversion rate, low product yield, ethane conversion activity and low conversion rate, to achieve the effects of simple preparation method, improved ethane reactivity, and improved ethane selective oxidation activity
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Embodiment 1
[0042] This example provides four pure silicon mesoporous materials KIT-6 prepared at different crystallization temperatures, which are prepared according to the following steps:
[0043] Add 95 g of hydrochloric acid with a concentration of 2.0 mol / L and 285 g of deionized water to 10 g of triblock copolymer P123, heat it in a constant temperature water bath at 35°C, seal it and perform magnetic stirring for 4 hours to dissolve the template agent, and obtain a template agent solution, the solution is transparent;
[0044] Add 12.6g of n-butanol to the template solution as a template additive, continue to stir for 1h to mix the solution evenly, then slowly drop in 32.1g of tetraethyl orthosilicate, continue to stir for 24h; pour the four solutions into crystallization Then, carry out crystallization treatment for 24h at the crystallization temperature conditions of 80°C, 100°C, 120°C, and 140°C respectively; after the crystallization treatment is completed, cool to room temper...
Embodiment 2
[0048] This example provides the pure silicon mesoporous material KIT-6 prepared under different crystallization times. The crystallization temperature is controlled at 100°C, and the crystallization time is 24h, 48h, and 72h respectively. Other preparation steps and process parameters are the same as those in the example 1 is the same.
[0049] figure 2 XRD spectra of pure silicon mesoporous material KIT-6 synthesized under different crystallization times. Depend on figure 2It can be seen that when the crystallization time is 24h, the characteristic peaks of pure silicon mesoporous material KIT-6 appear at the 2θ angles of 0.9° and 1.1°, indicating that the main body is pure silicon mesoporous material KIT-6. The characteristic fine diffraction peaks of the pure silicon mesoporous material KIT-6 at 1.5°-1.8° are not obvious, indicating that the channel regularity of the material is not too high; when the crystallization time is 48h and 72h, the 2θ angle is 0.9° and The c...
Embodiment 3
[0051] This example provides a pure silicon mesoporous material KIT-6 synthesized under optimized conditions. The crystallization temperature is controlled at 100° C., and the crystallization time is 24 hours. Other preparation steps and process parameters are the same as in Example 1.
[0052] image 3 The XRD spectrum of the pure silicon mesoporous material KIT-6 prepared for this example. Depend on figure 2 It can be seen that the characteristic peaks of pure silicon mesoporous material KIT-6 appear at 2θ angles of 0.9° and 1.1°, and they are relatively strong, which shows that the main body of the synthesized material is pure silicon mesoporous material KIT-6 , and the characteristic fine diffraction peak of the pure silicon mesoporous material KIT-6 also appeared at the 2θ angle of 1.6°-2.0°, and the peak was relatively obvious, which indicated that the synthesized material had a relatively good pore order.
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