Laser processing method
A laser processing method and laser technology, applied in stone processing equipment, laser welding equipment, metal processing equipment, etc., can solve problems such as functional layer damage
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[0027] Next, preferred embodiments of the laser processing method of the present invention will be described in detail with reference to the drawings.
[0028] figure 1 (a) and figure 1 (b) is a perspective view of an optical device wafer processed by the laser processing method of the present invention, and an enlarged sectional view of a main part. figure 1 (a) and figure 1 In the optical device wafer 10 shown in (b), for example, on the front surface 11a of a sapphire substrate 11 with a thickness of 120 μm, an optical device composed of an n-type nitride semiconductor layer and a p-type nitride semiconductor layer with a thickness of, for example, 10 μm is laminated. Layer (epitaxial layer) 12 (functional layer). In addition, optical devices 122 such as light-emitting diodes and laser diodes are formed in a plurality of regions in which the optical device layer (epitaxial layer) 12 is divided by a plurality of grid-shaped streets 121 . In addition, if the sapphire subs...
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Abstract
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