Joint debugging device and joint debugging method for workpiece table interferometer and mask table interferometer

Abstract

The invention relates to a joint debugging device and a joint debugging method for a workpiece table interferometer and a mask table interferometer. The joint debugging device is used for on-line detection and adjustment of the workpiece table interferometer and the mask table interferometer in a photo-etching machine. The joint debugging device comprises a multi-side reflector detection assembly, a light-splitting prism set assembly, and a multi-side reflector reflection assembly, wherein the multi-side reflector detection assembly is used for adjusting the workpiece table interferometer, thereby locking the position of the workpiece table interferometer; the light-splitting prism set assembly is used for adjusting the multi-side reflector reflection assembly, thereby locking the position of the multi-side reflector reflection assembly relative to the light-splitting prism set assembly; and the light-splitting prism set assembly and the multi-side reflector reflection assembly are jointly used for detecting the parallel degree of the emergent beam of the mask table interferometer and the emergent beam of the workpiece table interferometer, thereby locking the position of the masktable interferometer.

Description

technical field [0001] The invention relates to an interferometric measurement system of a lithography machine, in particular to a joint debugging device and a joint debugging method of a workpiece table interferometer and a mask table interferometer. Background technique [0002] In a lithography machine, the workpiece stage and the mask stage are each measured using a set of interferometric measurement systems. If the outgoing beam of the workpiece stage interferometer is not parallel to the outgoing beam of the mask stage interferometer, the alignment degree between the workpiece stage and the mask stage will be reduced, thereby affecting the performance of the lithography machine. Therefore, when installing the workpiece stage interferometer and the mask stage interferometer, it is necessary to ensure that the outgoing beam of the workpiece stage interferometer is parallel to the outgoing beam of the mask stage interferometer. [0003] like figure 1 As shown, in the li...

AI Technical Summary

Problems solved by technology

In order to ensure the performance of the lithography machine, when installing the workpiece stage interferometer 13 and the mask stage interferometer 15, it is necessary to ensure that the horizontal beam 131 emitted by the workpiece stage interferometer 13 is parallel to the horizontal beam 151 emitted by the mask stage interferometer 15, but , the distance between the workpiece stage interferometer 13 and the mask stage interferometer 15 is relatively large, usually greater than 1000 mm, and the horizontal beam 131 emitted by the workpiece stage interferometer 13 and the horizontal beam 151 emitted by the mask stage interferometer 15 cannot be simultaneously introduced into the Goniometric instrument, therefore, cannot detect and adjust the parallelism of the horizontal beam 131 emitted by the workpiece stage interferometer 13 and the horizontal beam 151 emitted by the mask stage interferometer 15 on-line

[0004] In addition, the structure of the lithography machine is complex and the spatial layout is compact. Using the long optical path measurement method to directly detect the parallelism between the horizontal beam 131 emitted by the workpiece stage interferometer 13 and the horizontal beam 151 emitted by the mask stage interferometer 15 will be affected by space factors. limitations, it is difficult to operate in practice

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