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Apparatus and method for protecting sample of secondary ion mass spectrometer

A technology of secondary ions and protection devices, which is applied in the direction of mass spectrometers, dynamic spectrometers, and parts of particle separator tubes, and can solve problems such as instrument contamination, sample melting, and sample destruction

Inactive Publication Date: 2011-10-26
INST OF GEOLOGY & GEOPHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] However, in actual use, it can be found that the secondary ion mass spectrometer designed by Cameca has the following defects: since the working state of the electron gun directly determines the stability of the surface voltage of the insulating sample and the accuracy of the analysis results, when some reasons ( When the electron gun is working abnormally due to the electrical drift of the instrument, the vacuum degree drop, and the particularity of the sample, the heat generated by the high-energy electrons emitted by the electron gun will melt the sample during the bombardment of the sample, thus destroying the sample while also damaging the sample. Instrument pollution

Method used

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  • Apparatus and method for protecting sample of secondary ion mass spectrometer
  • Apparatus and method for protecting sample of secondary ion mass spectrometer
  • Apparatus and method for protecting sample of secondary ion mass spectrometer

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Embodiment Construction

[0078] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on this The embodiments in the invention, and all other embodiments obtained by persons of ordinary skill in the art without creative effort, all belong to the scope of protection of the present invention.

[0079] Such as figure 1 As shown, the embodiment of the present invention provides a sample protection device for a secondary ion mass spectrometer. The secondary ion mass spectrometer includes an electron emission device and an electron deflection device. The electron emission device includes a filament 1, an emitter 2, An anode 3 , lenses 4 , 5 , and the electron deflection device includes a first electromagnetic device 8 and a deflection plate ...

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Abstract

The invention discloses an apparatus and a method for protecting a sample of a secondary ion mass spectrometer. The secondary ion mass spectrometer comprises an electron emitter and an electron deflection apparatus. An electron emitted by the electron emitter deflects through the electron deflection apparatus and reaches the surface of the sample. The sample protection apparatus and method adopt a structure of a sampling circuit, a control circuit and an electromagnetic adjusting apparatus. The control circuit controls the electromagnetic adjusting apparatus based on a monitor signal of the sampling circuit towards the sample. The electric field or magnetic field generated by the electromagnetic adjusting apparatus can change the motion locus of the electron and make the electron deviate from the sample so as to achieve the goal of protecting the sample.

Description

technical field [0001] The invention relates to a sample protection device and protection method of a secondary ion mass spectrometer, in particular to a device and method for protecting samples by preventing high-energy electrons emitted by an electron gun in a secondary ion mass spectrometer from destroying samples. Background technique [0002] When the secondary ion mass spectrometer analyzes the electronegative elements of an insulating sample, it needs to use positive ions (such as cesium ion Cs+ or gallium ion Ga+ plasma) to bombard the sample to ionize it, and apply a negative voltage Vs to the sample to make the bombardment generated Secondary ions of negative polarity are accelerated to the mass spectrometer. For insulating samples, during the bombardment process, a large number of secondary electrons are also generated while secondary ions are generated, which will cause the local voltage of the sample to be analyzed to change, making it impossible to analyze the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/02H01J49/42
Inventor 唐国强刘宇
Owner INST OF GEOLOGY & GEOPHYSICS CHINESE ACAD OF SCI
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