Wafer-level packaging structure and method of forming the same

A wafer-level packaging and chip mounting technology, which is applied in radiation control devices, electrical components, and electrical solid-state devices, etc., and can solve the problems of high wafer-level packaging process requirements, complex wafer-level packaging processes, and large restrictions on the size of chips. problem, to achieve the effect of high packaging quality, simple structure, and large room for manoeuvre

Active Publication Date: 2011-12-14
CHINA WAFER LEVEL CSP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, the wafer-level packaging of the prior art needs to embed the chip 6 to be packaged into the package substrate 2 (receptacle 4), and the chip 6 to be packaged will be strictly matched to the package structure, so that the size of the package structure is subject to The packaged chip 6 has large restrictions, and the existing wafer-level packaging process is complicated, which requires high wafer-level packaging technology

Method used

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  • Wafer-level packaging structure and method of forming the same
  • Wafer-level packaging structure and method of forming the same
  • Wafer-level packaging structure and method of forming the same

Examples

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no. 1 example

[0063] The method for forming the wafer-level packaging structure of the present invention will be described in detail below in conjunction with the first embodiment, please refer to image 3 , including the following steps:

[0064] Step S201, providing a first substrate, the first substrate has an opening, and the surface of the substrate facing away from the opening has an infrared filter film;

[0065] Step S202, providing a second substrate, the second substrate has a first surface and a second surface opposite to the first surface;

[0066] Step S203, bonding the surface of the first substrate with the opening to the first surface of the second substrate;

[0067] Step S204, forming a redistribution line on the second surface of the second substrate, the redistribution line exposes part of the second surface, and the exposed second surface corresponds to the position of the opening;

[0068] Step S205, forming a protective layer on the surface of the redistribution lin...

no. 2 example

[0118] The method for forming the wafer-level packaging structure of the present invention will be described in detail below in conjunction with the second embodiment, please refer to Figure 16 , including the following steps:

[0119] Step S301, providing a first substrate, the first substrate has a first opening, and the surface of the first substrate facing away from the first opening has an infrared filter film;

[0120] Step S302, providing a second substrate, the second substrate has a first surface and a second surface opposite to the first surface;

[0121] Step S303, bonding the surface of the first substrate having the first opening to the first surface of the second substrate;

[0122] Step S304, removing part of the second substrate along the second surface until the first substrate is exposed to form a second opening, the second opening completely exposes the first opening, and the width of the second opening is greater than the width of the first opening;

[0...

no. 3 example

[0147] Please refer to Figure 23 The difference between the wafer-level packaging structure forming method of this embodiment and the second embodiment is that: the first opening 301 and the second opening 304 are located in the second substrate 310, and the width of the second opening 304 is larger than that of the first opening 301 For the subsequent formation process, reference may be made to the corresponding steps in the second embodiment.

[0148] The wafer-level packaging structure formed by this embodiment includes: a first substrate 300, an infrared filter film 302 located on the surface of the first substrate 300; a second substrate 310 located on the surface of the first substrate 300 facing away from the infrared filter film 302; In the second substrate 310 and through the first opening 301 and the second opening 304 of the second substrate 310, and the width of the second opening 304 is greater than the width of the first opening 301; formed on the surface of the...

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Abstract

The invention provides a wafer level package structure and a formation method thereof. The method comprises the following steps: providing a substrate; forming a cavity in the substrate; forming a redistribution line in the substrate and on part surface of the cavity; providing a chip to be packaged, wherein the chip has a device surface and a basal surface opposite to the device surface; formingan Under Bump Metal on a soldering pad layer surface of the device surface and forming a bump on a surface of the Under Bump Metal; connecting the chip to be packaged with the substrate such that thechip to be packaged faces the cavity and the bump is electrically connected with the redistribution line. The wafer level package structure in the invention has the advantages of a simple structure, high packaging quality, and high compatibility in subsequent combination with PCB plate process. The wafer level package structure formation method in the invention has the advantages of simple process sequence and low cost.

Description

technical field [0001] The invention relates to the field of chip packaging, in particular to a wafer-level packaging structure and a forming method thereof. Background technique [0002] As the size of the chip becomes smaller and the function becomes stronger, the number of pads increases and the spacing between the pads continues to narrow. Correspondingly, higher requirements are put forward for the chip package. [0003] The traditional chip packaging method usually uses wire bonding (Wire Bonding) for packaging, but with the rapid development of chips, wafer level packaging (Wafer Level Package, WLP) gradually replaces wire bonding. More information on wafer-level packaging can be found in the patent documents, please refer to figure 1 , the existing wafer-level packaging structure, comprising: a substrate 2, the substrate 2 has a first pad 3 located on the first surface of the substrate 2, a second pad 3 located on the second surface of the substrate 2 pad 18, and t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/50H01L27/146H01L23/00H01L23/31
CPCH01L2224/16225
Inventor 王之奇李俊杰杨红颖俞国庆王宥军王蔚
Owner CHINA WAFER LEVEL CSP
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