A laser crystal structure of an intracavity frequency-doubling laser
A laser crystal and intra-cavity frequency doubling technology, which is applied in the field of lasers to achieve the effect of reducing volume, facilitating miniaturization, and facilitating mass production
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Embodiment 1
[0024] Such as figure 2 , the undoped crystal layers 2 and 4 are YVO 4 Crystal, doped crystal layer 3 is Nd:YVO 4 The crystal and the frequency doubling crystal layer 5 are KTP crystals. The undoped crystal layers 2, 4 and the doped crystal layer 3 are bonded together, and the undoped crystal layer 4 and the frequency doubling crystal layer 5 are bonded together by photoresist. The incident end is coated with an optical dielectric film with high transparency to 808nm and high reflection to 1064nm and 532nm; the output end is coated with an optical dielectric film with high reflection to 808nm and 1064nm and high transparency to 532nm.
Embodiment 2
[0026] Such as image 3 , the undoped crystal layers 2 and 4 are YAG crystals, the doped crystal layer 3 is Nd:YAG crystal, and the frequency doubling crystal layer 5 is LBO crystal. The undoped crystal layers 2, 4 and the doped crystal layer 3 are bonded together, and the undoped crystal layer 4 and the frequency doubling crystal layer 5 are bonded together by photoresist. The incident end is coated with an optical dielectric film with high transparency to 808nm and high reflection to 1064nm and 532nm; the output end is coated with an optical dielectric film with high reflection to 808nm and 1064nm and high transparency to 532nm.
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